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Method and apparatus for dimensioning integrated circuit devices

An integrated circuit and size technology, applied in the direction of electric solid devices, circuits, electrical components, etc., can solve the problems of poor repeatability of manual measurement, affecting measurement accuracy, and increasing time for manual measurement.

Active Publication Date: 2021-06-04
RAINTREE SCI INSTR SHANGHAI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This will bring some key problems: First, the time for manual measurement will increase; more importantly, the smaller the critical size of the integrated circuit, the worse the repeatability of manual measurement, which will affect the measurement accuracy.

Method used

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  • Method and apparatus for dimensioning integrated circuit devices
  • Method and apparatus for dimensioning integrated circuit devices
  • Method and apparatus for dimensioning integrated circuit devices

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Embodiment Construction

[0041] Preferred embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. Although preferred embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure can be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the disclosure to those skilled in the art.

[0042] As used herein, the term "comprise" and its variants mean open inclusion, ie "including but not limited to". The term "or" means "and / or" unless otherwise stated. The term "based on" means "based at least in part on". The terms "one example embodiment" and "one embodiment" mean "at least one example embodiment." The term "another embodiment" means "at least one further embodiment". The terms "first", "second", etc. may refer to di...

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Abstract

The present disclosure provides methods and apparatus for dimensioning integrated circuit devices for automatic, accurate, and high-volume characterization of integrated circuit devices. The method includes providing a template image of an integrated circuit device, the template image including a measurement tool indicating a location in the template image and a size to be measured. The method also includes determining the position of the target structure in the image-under-test based on the template image and the image-under-test of the integrated circuit device including the target structure. Additionally, the method includes determining the size of the target structure based on the measurement tool and the location of the target structure in the image-under-test. The embodiments of the present disclosure can measure the dimensions of integrated circuit devices automatically, accurately and in large quantities.

Description

technical field [0001] Embodiments of the present disclosure relate generally to the field of image-based dimensional measurement, and in particular to methods and apparatus for image-based dimensioning of integrated circuit devices. Background technique [0002] The current general method of measuring the critical dimensions of integrated circuits is to capture the image of the integrated circuit through an imaging device (such as a transmission electron microscope TEM, a scanning electron microscope SEM, etc.), and then manually draw a line on the image for the critical dimensions to determine the critical dimensions. size. This measurement method is inefficient, time-consuming and has poor repeatability of measurement results. [0003] Furthermore, imaging of cross-sectional slices of integrated circuits is required, for example, with a transmission electron microscope. Small process variations can affect the shape and size of the final device; therefore, a large number...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/02
CPCH01L27/0207
Inventor 张晓琳符祖标施耀明徐益平
Owner RAINTREE SCI INSTR SHANGHAI