Preparation method of tricholoma matsutake whitening facial mask lotion
A technology for whitening facial mask and matsutake mushrooms, which is applied to skin care preparations, medical preparations containing active ingredients, and pharmaceutical formulations, etc., can solve problems such as production technology control and change, and achieve significant moisturizing and whitening effects, improved efficacy, and no The effect of security risks
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Embodiment 1
[0047] This embodiment is used to illustrate the preparation method of plant facial mask liquid of the present invention.
[0048] (1) Sample pretreatment:
[0049] Matsutake extract: keep fresh matsutake at low temperature, cut into pieces, grind with liquid nitrogen, and mix with water 1:
[0050] 400 mass ratio, mixing and beating, to prepare matsutake pretreatment liquid.
[0051] Oatmeal: dry and pulverize oatmeal, sieve oatmeal powder, 150 meshes, to obtain oatmeal powder;
[0052] Tremella: tremella is dried and pulverized, and tremella powder is sieved to 200 mesh to obtain tremella powder;
[0053] (2) Add oat flour and tremella powder to the matsutake pretreatment solution obtained in step (1) according to the mass ratio in the following table, stir and heat at 80°C for 10 hours, and filter to remove impurities.
[0054] Raw material category parts by mass matsutake pretreatment liquid 100 oat flour 0.5 White fungus powder 5
[0...
Embodiment 2
[0057] This embodiment is used to illustrate the preparation method of plant facial mask liquid of the present invention.
[0058] (1) Sample pretreatment:
[0059] Matsutake extract: keep fresh matsutake at low temperature, cut into pieces, grind with liquid nitrogen, and mix with water 1:
[0060] The mass ratio of 100 is mixed and beaten to prepare matsutake pretreatment liquid.
[0061] Oatmeal: dry and pulverize oatmeal, sieve oatmeal powder, 150 meshes, to obtain oatmeal powder;
[0062] Tremella: tremella is dried and pulverized, and tremella powder is sieved to 200 mesh to obtain tremella powder;
[0063](2) Add oat flour\tremella powder to the matsutake pretreatment solution obtained in step (1) according to the mass ratio in the following table, stir and heat at 90 degrees Celsius for 5 hours, and filter through 100 mesh to remove impurities.
[0064] Raw material category parts by mass matsutake pretreatment liquid 100 oat flour 1 Whi...
Embodiment 3
[0067] This embodiment is used to illustrate the preparation method of plant facial mask liquid of the present invention.
[0068] (4) Sample pretreatment:
[0069] Matsutake extract: keep fresh matsutake at low temperature, cut into pieces, grind with liquid nitrogen, and mix with water 5:
[0070] The mass ratio of 100 is mixed and beaten to prepare matsutake pretreatment liquid.
[0071] Oatmeal: dry and pulverize oatmeal, sieve the oatmeal powder to 200 meshes to obtain oatmeal powder;
[0072] Tremella: tremella is dried and pulverized, and tremella powder is sieved to 200 mesh to obtain tremella powder;
[0073] (5) Add oat flour\tremella powder to the matsutake pretreatment liquid obtained in step (1) according to the mass ratio in the following table, stir and heat at 70 degrees Celsius for 10 hours, and filter through 100 mesh to remove impurities.
[0074] Raw material category parts by mass matsutake pretreatment liquid 100 oat flour 5 ...
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