Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Neural network training method and device

A neural network training and neural network technology, applied in the field of chip processing, can solve problems such as irregular topological structure and difficult performance improvement of processing platforms

Pending Publication Date: 2020-07-07
CAMBRICON TECH CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the sparse neural network after pruning will introduce irregularities, which will make the topology of the original rules irregular, making it difficult for the processing platform to obtain performance improvements.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Neural network training method and device
  • Neural network training method and device
  • Neural network training method and device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0038] The following will clearly and completely describe the technical solutions in the embodiments of the present application with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of this application.

[0039] The terms "first", "second", "third" and "fourth" in the specification and claims of the present application and the drawings are used to distinguish different objects, rather than to describe a specific order . Furthermore, the terms "include" and "have", as well as any variations thereof, are intended to cover a non-exclusive inclusion. For example, a process, method, system, product or device comprising a series of steps or units is not limited to the listed ste...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a neural network training method and a neural network training device. The neural network training device comprises a selection unit and an operation unit, wherein the operationunit is used for training a neural network. The neural network training method and the neural network training device provided by the invention have the advantages of low cost and low energy consumption.

Description

technical field [0001] The present application relates to the technical field of chip processing, in particular to a neural network training method and device. Background technique [0002] Neural networks have been used very successfully. But as we design larger and deeper neural networks, more weights will be introduced, and super-large weights become a huge challenge for neural network applications. Large-scale weights also put forward higher requirements on the computing unit, and the computing time and computing energy consumption increase accordingly. Therefore, reducing the weight of the neural network and reducing the calculation time has become an urgent problem to be solved. [0003] At present, most of the work mainly uses the method of pruning to cut the neurons or weights of the neural network, thereby reducing the scale of the neural network parameters, thereby reducing the calculation time. However, the sparse neural network after pruning will introduce irr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G06N3/08G06N3/04
CPCG06N3/08G06N3/084G06N3/045
Inventor 不公告发明人
Owner CAMBRICON TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products