Method for recovering copper from acidic copper-containing etching solution and preparing cuprous oxide

A cuprous oxide and copper etching technology, applied in rotary drum furnaces, crucible furnaces, furnaces, etc., can solve problems such as difficult operation and maintenance, low economic value, complex structure, etc., and achieve significant water saving, environmental protection, and good recycling Utilization rate, effect of high added value

Inactive Publication Date: 2020-09-08
SICHUAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] 1. Its preparation process is only suitable for laboratory research and cannot realize large-scale industrial application;
[0005] 2. The structure of the treatment equipment for acidic copper-containing etching waste liquid is complicated, and the operation and maintenance work is difficult;
[0006] 3. Most of the preparation process is prepared by electrodeposition method and the prepared products are mainly pure copper. The electrodeposition equipment has complex structure, high energy consumption and low economic value

Method used

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  • Method for recovering copper from acidic copper-containing etching solution and preparing cuprous oxide
  • Method for recovering copper from acidic copper-containing etching solution and preparing cuprous oxide
  • Method for recovering copper from acidic copper-containing etching solution and preparing cuprous oxide

Examples

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Embodiment 1

[0036] An acidic etching waste solution, Cu 2+ The concentration is 200g / L, H + The concentration is 2.5mol / L, containing a lot of chloride ions. Such as figure 1 As shown in the schematic diagram of the process flow, the acidic copper-containing etching waste liquid is pre-filtered to remove fine insoluble particles in the industrial acidic copper-containing etching waste liquid, and then an appropriate amount of NaOH is added to adjust the pH value of the solution to 2-4, and sequentially add Appropriate amount of Na 2 SO 4 and BaCO 3 , stand still for 60 minutes, use a precision filter to remove the precipitate, add an appropriate amount of ammonia water, and adjust the pH value to 2-4 again to obtain a crude copper-containing solution. Use MextralDT100 diluted extraction agent Mextral984H to extract the copper ions in the crude copper solution, wherein the concentration of the extraction agent is 50%, the volume ratio of the extraction agent to the copper-containing e...

Embodiment 2

[0038] An acidic etching waste solution, Cu 2+ The concentration is 150g / L, H + The concentration is 2mol / L, containing a large amount of chloride ions. Such as figure 1 As shown in the schematic diagram of the process flow, the acidic copper-containing etching waste liquid is pre-filtered to remove fine insoluble particles in the industrial acidic copper-containing etching waste liquid, and then an appropriate amount of NaOH is added to adjust the pH value of the solution to 2-4, and sequentially add Appropriate amount of Na 2 SO 4 and BaCO 3, stand still for 60 minutes, use a precision filter to remove the precipitate, add an appropriate amount of ammonia water, and adjust the pH value to 2-4 again to obtain a crude copper-containing solution. Use MextralDT100 diluted extraction agent Mextral984H to extract the copper ions in the blister copper solution, wherein the concentration of the extraction agent is 40%, the volume ratio of the extraction agent to the copper-cont...

Embodiment 3

[0040] An acidic etching waste solution, Cu 2+ The concentration is 50g / L, H + The concentration is 0.7mol / L, containing a lot of chloride ions. Such as figure 1 As shown in the schematic diagram of the process flow, the acidic copper-containing etching waste liquid is pre-filtered to remove fine insoluble particles in the industrial acidic copper-containing etching waste liquid, and then an appropriate amount of NaOH is added to adjust the pH value of the solution to 2-4, and sequentially add Appropriate amount of Na 2 SO 4 and BaCO 3 , stand still for 60 minutes, use a precision filter to remove the precipitate, add an appropriate amount of ammonia water, and adjust the pH value to 2-4 again to obtain a crude copper-containing solution. Use MextralDT100 diluted extractant Mextral984H to extract copper ions in blister copper solution, wherein the concentration of extractant is 20%, the volume ratio of extractant to copper-containing etching waste liquid is (O / A) 5:1, and...

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Abstract

The invention discloses a method for recovering copper from an acidic copper-containing etching solution and preparing cuprous oxide. The method comprises the following steps of: S1, filtering the acidic copper-containing etching solution to obtain a crude copper-containing solution; S2, adjusting the pH of the crude copper-containing solution to 2-4, adding an extractant, mixing and stirring, standing for layering, wherein the upper layer is a primary copper-containing organic phase, and the lower layer is a primary water phase; recovering the primary water phase for an etching production line; S3, washing the copper-containing organic phase with deionized water, and separating to obtain a secondary copper-containing organic phase and a primary washing water phase; S4, adding sulfuric acid into the secondary copper-containing organic phase, fully stirring, standing for layering, wherein the upper layer is an extractant-containing organic phase, and the lower layer is a CuSO 4-containing water phase; S5, adding the primary washing water phase into the extractant-containing organic phase, washing, standing for layering to obtain a pure extractant organic phase for use in the step S2; and S6, preparing cuprous oxide from the CuSO 4-containing water phase by a hydrothermal method or a chemical precipitation method.

Description

technical field [0001] The invention relates to the field of copper resource recovery and utilization, in particular to a method for recovering copper from an acidic copper-containing etching solution and preparing cuprous oxide. Background technique [0002] After the printed circuit board is etched, a large amount of copper-containing waste etching solution will be produced, and with the development of the electronics industry, the discharge of copper-containing waste etching solution is increasing day by day. Etching waste liquid can be divided into two categories: acidic and alkaline. In China, it is mainly acidic etching liquid. The acidic waste liquid mainly contains copper chloride and hydrochloric acid, etc. The content of copper ions is generally 10-250g / L, and the concentration of free hydrochloric acid is generally 0.5-6mol / L. If the acidic etching waste liquid is discharged directly, it will seriously pollute the environment and lead to a huge waste of heavy met...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C22B7/00C22B15/00C23F1/46
CPCC22B7/006C22B15/0086C22B15/0089C23F1/46
Inventor 袁绍军欧阳李科贺华强梁斌
Owner SICHUAN UNIV
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