Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Pixel graph preprocessing method

A pre-processing, graphic technology, applied in the photoengraving process of the pattern surface, the original for opto-mechanical processing, optics, etc., can solve the problem of not meeting the requirements of OPC correction

Pending Publication Date: 2020-12-04
SHANGHAI HUALI MICROELECTRONICS CORP
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, it can be known that if a certain hypotenuse of the input layout graphics has a bulge, such a bulge 111 will cause an abnormal correction of the OPC-processed graphic, which cannot meet the OPC correction requirements.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Pixel graph preprocessing method
  • Pixel graph preprocessing method
  • Pixel graph preprocessing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0038] The specific implementation manner of the present invention will be described in more detail below with reference to schematic diagrams. The advantages and features of the present invention will be more apparent from the following description. It should be noted that all the drawings are in a very simplified form and use imprecise scales, and are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention.

[0039] Hereinafter, the terms "first", "second", etc. are used to distinguish between similar elements, and are not necessarily used to describe a specific order or chronological order. It is to be understood that these terms so used are interchangeable under appropriate circumstances. Similarly, if a method described herein includes a series of steps, the order in which these steps are presented is not necessarily the only order in which these steps can be performed, and some described steps may be omitted and / or...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a pixel graph preprocessing method. The pixel graph preprocessing method comprises the steps that a to-be-tested layout of a pixel graph is input; whether the bevel edge of theto-be-tested layout has a bulge or not is judged; and if the bevel edge of the to-be-tested layout has the bulge, zooming-in and zooming-out processing on the to-be-tested layout are carried out to remove the bulge of the bevel edge. According to the pixel graph preprocessing method provided by the invention, before OPC processing is carried out on the to-be-tested layout, whether the bevel edge of the to-be-tested layout is provided with the bulge or not is judged firstly, if the bulge exists, the bulge is eliminated, the OPC processing is not abnormal, and then the graph after the OPC processing reaches the standard.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a preprocessing method for pixel graphics. Background technique [0002] In the IC process manufacturing process, the pixel graphics that are repeatedly arranged play an important role. However, in the OPC publishing process, some unfriendly designs are often found. There are gaps in the hypotenuse of the Pixel graphics, which will cause OPC correction abnormalities, reaching It is less than its industrial requirements, resulting in a decrease in yield. like figure 1 as shown, figure 1 The input layout graphic 100 is also a Pixel graphic. It can be seen from the shape of the input layout graphic 100 that the input layout graphic 100 has multiple hypotenuses 110 . It was found that the hypotenuse 110 may have a smaller protrusion 111, for example, figure 2 . When performing OPC processing on the input layout graph 100, the graph 200 after OPC processing is obtained, s...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G03F1/36
CPCG03F1/36
Inventor 宋康陈翰顾婷婷张浩
Owner SHANGHAI HUALI MICROELECTRONICS CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com