Intensive optical wave multiplexing optical filter

A light wave multiplexing and optical filter technology, which is applied in the field of optical communication devices, can solve the problems of filter friction damage and increase in defective rate, and achieve the effects of reducing manufacturing costs, preventing friction damage, and avoiding substrate distortion

Inactive Publication Date: 2020-12-18
GUANGZHOU JIAHE PHOTOELECTRIC TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the operation of the polishing process is likely to cause frictional damage to the filter, resulting in an increase in the defective rate

Method used

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  • Intensive optical wave multiplexing optical filter
  • Intensive optical wave multiplexing optical filter
  • Intensive optical wave multiplexing optical filter

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Embodiment Construction

[0021] This part will describe the specific embodiment of the present invention in detail, and the preferred embodiment of the present invention is shown in the accompanying drawings. Each technical feature and overall technical solution of the invention, but it should not be understood as a limitation on the protection scope of the present invention.

[0022] In the description of the present invention, it should be understood that the orientation descriptions, such as up, down, front, back, left, right, etc. indicated orientations or positional relationships are based on the orientations or positional relationships shown in the drawings, and are only In order to facilitate the description of the present invention and simplify the description, it does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the present invention.

[0023] I...

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Abstract

The invention discloses an intensive optical wave multiplexing optical filter, which comprises a substrate, and an optical filter layer and an anti-radiation layer which respectively cover two opposite surfaces of the substrate, and is characterized in that the surface, opposite to the substrate, of the optical filter layer is also provided with an anti-scraping layer, so that the optical filter layer can be prevented from being damaged due to friction when polishing operation is required subsequently, and the yield of the optical filter is ensured; meanwhile, the first dielectric sub-layer forming the filter layer is made of silicon hydride, so that the total layer number of the filter layer is reduced to be not more than 84, and the layer thickness is not more than 20 [mu] m. Compared with the prior art, the thickness of the filter layer is greatly reduced, and light loss, light path disruption and stress accumulation caused by over-thickness of the filter layer are effectively inhibited; and the overall manufacturing cost is reduced.

Description

technical field [0001] The invention relates to the field of optical communication devices, in particular to a dense light wave multiplexing filter. Background technique [0002] The traditional DWDM: Dense Wavelength Division Multiplexing (DWDM: Dense Wavelength Division Multiplexing) system uses a filter film with as many as 150 layers and a film thickness of nearly 38 μm. Light scatter and absorption occur in the light wave multiplexing system; and if Submicron particles are attached to the film layer, the attachment will form a nuclear package and grow into a so-called nodule (Nodule). A film with many spheres will be scattered inside and on the surface of the film, causing light loss and light path confusion. This phenomenon will become more obvious as the number of coating layers increases. [0003] During vacuum coating, atoms or molecules are rapidly cooled and attached to the substrate. The arrangement of the molecules on the substrate is not at the lowest energy p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/28G02B1/14G02B1/115G02B6/293
CPCG02B5/285G02B1/14G02B1/115G02B6/29361
Inventor 陈信源何伟峰温勇健
Owner GUANGZHOU JIAHE PHOTOELECTRIC TECH CO LTD
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