Propolis acne-removing balance base solution and preparation method thereof

A base liquid and balanced technology, applied in the direction of pharmaceutical formulations, cosmetic preparations, dressing preparations, etc., can solve the problems of skin surface flora imbalance, allergies, consumer allergies, etc., and achieve good whitening effect

Pending Publication Date: 2020-12-25
北京蜜慕科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Frequent use of anti-acne cosmetics containing antibiotics is likely to cause imbalance of the skin surface bacteria and lead to the emergence of drug-resistant bacteria, or cause other infections. Cosmetics containing antibiotics

Method used

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  • Propolis acne-removing balance base solution and preparation method thereof

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Embodiment Construction

[0024] Specific embodiments of the present invention will be described in detail below.

[0025] Such as figure 1 Shown, a kind of preparation method of propolis anti-acne balance base liquid, in parts by mass, comprises the following steps:

[0026] (1) Disinfect the emulsification pot for later use after cleaning;

[0027] (2) Pour 50 parts of water and 16.5 parts of sodium calcium phosphosilicate into the emulsification pot after step (1), stir evenly and heat to 85°C;

[0028] (3), keep the water temperature at 85°C, add 5 parts of propolis extract, 15 parts of glycerin, and 13 parts of propylene glycol sequentially while stirring, and obtain a mixed solution after completely dissolving, and then keep the mixed solution at 85°C for 40 minutes;

[0029] (4) Stop heat preservation, and when the temperature of the mixture in the emulsification pot drops to 50°C, add 0.1 parts of o-cymene-5-ol and 0.3 parts of 1,2-hexanediol to the emulsification pot while stirring , 0.1 pa...

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Abstract

The invention discloses a preparation method for a propolis acne-removing balance base solution. The preparation method comprises the following steps: (1) an emulsifying pot is cleaned and then disinfected for later use; (2) 50 parts of water and 16.5 parts of calcium phosphosilicate are poured into the emulsifying pot, are uniformly stirred, and are heated to 85 DEG C; (3) water temperature is kept at 85 DEG C, 5 parts of propolis extract, 15 parts of glycerol and 13 parts of propylene glycol are sequentially added while stirring is performed, a mixed solution is obtained after complete dissolving, and heat preservation is performed on the mixed solution at 85 DEG C for 40 minutes; and (4) heat preservation is stopped, when the mixed solution in the emulsifying pot is cooled to 50 DEG C,0.1 part of o-cymene-5-alcohol, 0.3 part of 1,2-hexanediol and 0.1 part of ethylhexylglycerin are added into the emulsifying pot while stirring is performed, and after uniform stirring, slow cooling is performed to 37 DEG C to obtain the propolis acne-removing balance base solution. The invention further discloses the propolis acne-removing balance base solution prepared by the method.

Description

technical field [0001] The invention belongs to the field of cosmetics, and in particular relates to a propolis acne-removing and balancing base liquid and a preparation method thereof. Background technique [0002] Acne (acne) is a common chronic hair follicle and sebaceous gland inflammatory skin disease caused by various factors. The chest and other parts rich in sebaceous glands have the highest incidence rate in adolescence. [0003] Current studies believe that the pathogenesis of acne is mainly related to the following four factors: excessive sebum secretion, hyperkeratosis at the opening of the pilosebaceous gland duct, proliferation of Propionibacterium acnes, and inflammatory response. The acne marks and pits left after acne healing will affect the patient's appearance and quality of life, and even bring psychological pressure to the patient. [0004] In recent years, many batches of anti-acne balance base liquid have been detected to contain antibiotic ingredien...

Claims

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Application Information

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IPC IPC(8): A61K8/98A61K8/34A61K8/25A61Q19/00A61Q17/00A61Q19/08A61Q19/02A61P17/10
CPCA61K8/988A61K8/345A61K8/25A61K8/347A61Q19/00A61Q17/005A61Q19/005A61Q19/08A61Q19/02A61P17/10
Inventor 于进勇
Owner 北京蜜慕科技有限公司
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