Patents
Literature
Patsnap Copilot is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Patsnap Copilot

574 results about "Ethylhexylglycerin" patented technology

Ethylhexylglycerin, or octoxyglycerin, is a glyceryl ether that is commonly used as part of a preservative system in cosmetic preparations.

Anticorrosive component-free composition having antibiosis effect, and preparation method and application thereof

ActiveCN107432834AHas activity against Gram bacteriaSynergistic sterilizationAntibacterial agentsCosmetic preparationsCaprylyl GlycolCAPRYLHYDROXAMIC ACID
The invention discloses an anticorrosive component-free composition having an antibiosis effect. The composition comprises, by weight, 20-45% of p-hydroxyacetophenone, 3-10% of glycerol caprylate, 6-15% of caprylhydroxamic acid, 21-40% of propylene glycol, 0.5-1.5% of caprylyl glycol and 5-15% of ethylhexylglycerin, and the sum of the weight percentages of all above components is 100%. The anticorrosive component-free composition having the antibiosis effect has the advantages of no irritation, non-allergy, protruding antibiosis effect, harmlessness to human bodies, and no toxic or side effects, and can be safely applied to cosmetics. The invention also discloses a preparation method of the anticorrosive component-free composition having the antibiosis effect. The preparation method of the composition has the advantages of few steps, simple flow, and safety in operation. The invention further discloses an essence and a preparation method thereof. The essence has the advantages of good antibiosis effect, wide antibiosis range, no toxicity, harm or irritation, and high use safety, and the preparation method of the essence has the advantages of few steps, simple flow, and safety in operation.
Owner:广州市皓雨化妆品有限公司

Deep cleansing and moisturizing attached type mask containing taxuscanadensis extract and preparation method of deep cleansing and moisturizing attached type mask

The invention relates to a deep cleansing and moisturizing attached type mask containing a taxuscanadensis extract. The deep cleansing and moisturizing attached type mask containing the taxuscanadensis extract consists of the following 41 ingredients: the taxuscanadensis extract, water, glycerine, butanediol, polyethylene glycol-400, glycine betaine, hyaluronic acid, oat beta-glucan, ascorbic acid, tea polyphenols, sodium hyaluronate, a tremella sporocarp extract, a chondrus crispus extract, a ginseng root extract, a hydrolyzed adansonia digitata extract, a centella asiatica extract, a grape seed extract, aloe vera gel, hydrolytic collagen, serine, histidine, aspartic acid, alanine, xanthan, methyl hydroxybenzoate, carbomer, trehalose, EDTA (ethylene diamine tetraacetic acid) disodium, hydroxypropyl methyl celluloses, allantoin, sorbitol, ethylhexylglycerin, polyquaternary salt-10, ethoxy urea, saualane, PEG-40 hydrogenated castor oil, forulic acid, resveratrol, dipotassium glycyrrhizinate, triethanolamine and phenoxyethanol. The taxuscanadensis extract in the attached type mask can remove free radicals, and meanwhile, effects of thinning pores, brightening skin and moisturizing skin can be achieved.
Owner:无锡薇泰药物技术有限公司

Moisturizing combination containing cladosiphon novae-caledoniae extract and preparation method thereof

The invention discloses a moisturizing combination containing cladosiphon novae-caledoniae extract and a preparation method thereof, relates to the technical field of skin care products, and solves atechnical problem of poor moisturizing effects of existing moisturizing products. The moisturizing combination is characterized by comprising an A component and a B component, the A component is prepared from the following ingredients in parts by weight: 2.12 to 13 parts of sodium hyaluronate mixture, 2 to 7 parts of saccharide isomer, 6 to 15 parts of alcohol humectant, 0.01 to 0.2 part of ethylhexyl glycerol, 15 to 25 parts of deionized water; the B component is prepared from the following ingredients in parts by weight: 20 to 30 parts of cladosiphon novae-caledoniae extract and 10 to 20 parts of 1,3-propylene glycol. The aquaporin expression can be promoted by adopting sodium hyaluronate to supplement and store water, and compounding of saccharide isomer and polyquaternium-51, and the cladosiphon novae-caledoniae extract forms a dense invisible protective film, and the moisturizing combination containing the cladosiphon novae-caledoniae extract has the advantages of supplementing water in an outer layer, locking water in an inner layer, moisturizing layer by layer, and moisturizing and lightening skin from the inside to out.
Owner:上海煓梅生物科技有限公司

Chitosan derivative based clean makeup-removing wet tissue with effects of bacterial inhibition and moisture preservation and preparation method of chitosan derivative based clean makeup-removing wet tissue

The invention discloses chitosan derivative based clean makeup-removing wet tissue with effects of bacterial inhibition and moisture preservation. The chitosan derivative based clean makeup-removing wet tissue with the effects of bacterial inhibition and moisture preservation is prepared from raw materials in percentage by weight as follows: 2%-5% of chitosan derivatives, 5%-10% of PEG-8 caprylic/capric glycerides, 3%-8% of butanediol, 2%-5% of glycerin, 1%-3% of trehalose, 1%-5% of olive oil PEG-6 esters, 0.5%-3% of a skin conditioner, 0.15%-0.3% of phenoxyethanol, 0.15%-0.3% of ethylhexylglycerin, 0.1%-0.2% of methylparaben, 0.05%-0.2% of sodium hyaluronate, 0.01%-0.05% of essence and the balance of deionized water. According to the chitosan derivative based clean makeup-removing wet tissue with the effects of bacterial inhibition and moisture preservation and a preparation method, the makeup-removing wet tissue prepared with the preparation method is low in production cost, high in stability and good in cleansing power and realizes deep cleaning, besides, the makeup-removing wet tissue further has the effects of bacterial inhibition and moisture preservation, the facial skin after application of the makeup-removing wet tissue is smooth and tender, and makeup residues on the facial skin are removed.
Owner:湖北立天生物工程有限公司

Preparation method of compound plant allergy-relieving and repairing essence

The invention provides a preparation method of compound plant allergy-relieving and repairing essence. The compound plant allergy-relieving and repairing essence is prepared from the following raw materials in parts by weight: a relieving and anti-allergy agent (rhizoma gastrodiae extract, astragalus membranaceus extract, calendula extract, flos albiziae extract and radix saposhnikoviae extract),a heat-clearing and swelling-eliminating agent (a radix geutianae extracting solution, herba pogostemonis extract, Chinese pulsatilla root extract and rheum palmatum root extract), purslane herb extract, butanediol, xylitol, aloe extract, a stimulation inhibitor (rosemary extract, chrysanthellum indicum extract, tea leaf extract, glycyrrhiza glabra root extract, polygonum cuspidatum root extract,scutellaria baicalensis root extract and centella asiatica root extract), beta-glucan, a relieving and anti-inflammatory agent (bisabolol, paeonol, matairesinol, glycyrrhetinic acid and heparin sodium), 1,2-hexanediol, p-hydroxyacetophenone, small molecular sodium hyaluronate, sodium hyaluronate, 9010 (phenoxyethanol and ethylhexylglycerin), essence and PPG-26-butanol polyether / PEG-40 hydrogenatedcastor oil. The allergy-relieving and repairing essence provided by the invention is easy to prepare and is suitable for large-scale application and industrial production; various natural plant extract components are added so that the allergy-relieving and repairing essence has the effects of clearing away heat and eliminating swelling, relieving sensitive skin, repairing damaged skin, reducing reddening, resisting external stimulation, stopping itching and moisturizing and the like.
Owner:GUANGZHOU DEVA BIOTECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products