Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Deep cleansing and moisturizing attached type mask containing taxuscanadensis extract and preparation method of deep cleansing and moisturizing attached type mask

A technology of yew leaves and extracts, applied in skin care preparations, pharmaceutical formulas, cosmetic preparations, etc., can solve problems such as inability to comprehensively and quickly improve skin conditions, lack of detailed description of mask technology, and too simple description of efficacy, etc., to achieve Easy to implement, refines pores, and strengthens the cleaning effect

Inactive Publication Date: 2018-04-27
无锡薇泰药物技术有限公司
View PDF4 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Masks can solve five major skin problems at the same time: moisturizing, whitening, oil control, anti-sensitivity and anti-aging, while daily skin care products often only address some of these problems, and cannot comprehensively and quickly improve skin conditions
However, the patent does not specify the mask process in detail, only the ingredients, and there is no specific ingredient formula, and there will be implementation problems in the examples. It only shows that the mask has anti-oxidation properties, and the description of the effect is too simple

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] The deep cleansing and moisturizing mask of the present embodiment contains yew leaf extract, its formula is 0.1% of northeast yew extract (twigs and leaves), 6% glycerin, 3% butylene glycol, polyethylene glycol- 400 1%, Betaine 1%, Hyaluronic Acid 0.4%, Oat Beta-Glucan 0.2%, Ascorbic Acid (Vitamin C) 0.08%, Tea Polyphenols 0.01%, Sodium Hyaluronate 0.15%, Tremella Fruiting Body Extract 0.15%, Crinkle Carrageen Extract 0.03%, Ginseng Root Extract 0.02%, Hydrolyzed Baobab Extract 0.02%, Centella Asiatica Extract 0.02%, Grape Seed Extract 0.02%, Aloe Vera Gel 0.2 %, Hydrolyzed Collagen 0.1%, Serine 0.01%, Histidine 0.02%, Aspartic Acid 0.04%, Alanine 0.02%, Xanthan Gum 0.05%, Methylparaben 0.05%, Carbomer 0.1%, Seaweed Sugar 0.2%, Disodium EDTA 0.05%, Hydroxypropylmethylcellulose 0.05%, Allantoin 0.1%, Sorbitol 0.1%, Ethylhexylglycerin 0.2%, Polyquaternium-10 0.05%, Hydroxyethylurea 0.5%, Squalane 0.1%, PEG-40 Hydrogenated Castor Oil 0.2%, Ferulic Acid 0.02%, Resveratrol...

Embodiment 2

[0045] The deep-seated cleansing moisturizing facial mask containing the yew leaf extract of the present embodiment has a formula of 0.1% of the southern yew (branch, leaf) extract, 8% of glycerin, 4% of butylene glycol, polyethylene glycol- 400 1%, betaine 1%, hyaluronic acid 0.5%, oat β-glucan 0.3%, ascorbic acid (vitamin C) 0.08%, tea polyphenols 0.01%, sodium hyaluronate 0.25%, white fungus fruiting body extract 0.25%, Crinkle Carrageen Extract 0.03%, Ginseng Root Extract 0.02%, Hydrolyzed Baobab Extract 0.02%, Centella Asiatica Extract 0.02%, Grape Seed Extract 0.02%, Aloe Vera Gel 0.2 %, Hydrolyzed Collagen 0.1%, Serine 0.01%, Histidine 0.02%, Aspartic Acid 0.04%, Alanine 0.02%, Xanthan Gum 0.05%, Methylparaben 0.05%, Carbomer 0.1%, Seaweed Sugar 0.2%, Disodium EDTA 0.05%, Hydroxypropylmethylcellulose 0.05%, Allantoin 0.1%, Sorbitol 0.2%, Ethylhexylglycerin 0.2%, Polyquaternium-10 0.05%, Hydroxyethylurea 0.5%, Squalane 0.1%, PEG-40 Hydrogenated Castor Oil 0.2%, Ferulic ...

Embodiment 3

[0061] The deep-seated cleansing moisturizing facial mask containing the yew leaf extract of the present embodiment has a formula of 0.15% of the northeast yew (twig, leaf) extract, 7% of glycerin, 4% of butylene glycol, polyethylene glycol- 400 1%, betaine 1%, hyaluronic acid 0.5%, oat β-glucan 0.4%, ascorbic acid (vitamin C) 0.08%, tea polyphenols 0.01%, sodium hyaluronate 0.3%, white fungus fruiting body extract 0.3%, Crinkle Carrageen Extract 0.03%, Ginseng Root Extract 0.02%, Hydrolyzed Baobab Extract 0.02%, Centella Asiatica Extract 0.02%, Grape Seed Extract 0.02%, Aloe Vera Gel 0.2 %, Hydrolyzed Collagen 0.1%, Serine 0.01%, Histidine 0.02%, Aspartic Acid 0.04%, Alanine 0.02%, Xanthan Gum 0.05%, Methylparaben 0.05%, Carbomer 0.1%, Seaweed Sugar 0.2%, Disodium EDTA 0.05%, Hydroxypropylmethylcellulose 0.05%, Allantoin 0.1%, Sorbitol 0.3%, Ethylhexylglycerin 0.2%, Polyquaternium-10 0.05%, Hydroxyethylurea 0.5%, Squalane 0.1%, PEG-40 Hydrogenated Castor Oil 0.2%, Ferulic Ac...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a deep cleansing and moisturizing attached type mask containing a taxuscanadensis extract. The deep cleansing and moisturizing attached type mask containing the taxuscanadensis extract consists of the following 41 ingredients: the taxuscanadensis extract, water, glycerine, butanediol, polyethylene glycol-400, glycine betaine, hyaluronic acid, oat beta-glucan, ascorbic acid, tea polyphenols, sodium hyaluronate, a tremella sporocarp extract, a chondrus crispus extract, a ginseng root extract, a hydrolyzed adansonia digitata extract, a centella asiatica extract, a grape seed extract, aloe vera gel, hydrolytic collagen, serine, histidine, aspartic acid, alanine, xanthan, methyl hydroxybenzoate, carbomer, trehalose, EDTA (ethylene diamine tetraacetic acid) disodium, hydroxypropyl methyl celluloses, allantoin, sorbitol, ethylhexylglycerin, polyquaternary salt-10, ethoxy urea, saualane, PEG-40 hydrogenated castor oil, forulic acid, resveratrol, dipotassium glycyrrhizinate, triethanolamine and phenoxyethanol. The taxuscanadensis extract in the attached type mask can remove free radicals, and meanwhile, effects of thinning pores, brightening skin and moisturizing skin can be achieved.

Description

technical field [0001] The invention relates to the field of cosmetics, in particular to a deep cleansing and moisturizing face mask containing yew leaf extract and a preparation method thereof. Background technique [0002] The facial mask market has become one of the fastest growing market segments in my country's daily chemical industry. The rapid development of facial masks is closely related to their efficacy. Masks can solve five major skin problems at the same time: moisturizing, whitening, oil control, anti-sensitivity and anti-aging, while daily skin care products often only address some of these problems and cannot comprehensively and quickly improve skin conditions. The mask uses the short time covered on the face to temporarily isolate the outside air and pollution, increase the temperature of the skin and expand pores, promote the secretion and metabolism of sweat glands, and increase the oxygen content of the skin. The moisture in the mask penetrates into the...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9794A61K8/9789A61K8/9755A61K8/9728A61K8/73A61K8/67A61K8/65A61K8/49A61K8/44A61K8/365A61K8/34A61K8/02A61Q19/00A61Q19/10
CPCA61K8/0212A61K8/345A61K8/365A61K8/44A61K8/4946A61K8/65A61K8/676A61K8/73A61K8/735A61K8/97A61Q19/00A61Q19/10
Inventor 年夫光刘婷婷张建强周赟李辉钱黎丽王征
Owner 无锡薇泰药物技术有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products