Deep cleansing and moisturizing attached type mask containing taxuscanadensis extract and preparation method of deep cleansing and moisturizing attached type mask
A technology of yew leaves and extracts, applied in skin care preparations, pharmaceutical formulas, cosmetic preparations, etc., can solve problems such as inability to comprehensively and quickly improve skin conditions, lack of detailed description of mask technology, and too simple description of efficacy, etc., to achieve Easy to implement, refines pores, and strengthens the cleaning effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0029] The deep cleansing and moisturizing mask of the present embodiment contains yew leaf extract, its formula is 0.1% of northeast yew extract (twigs and leaves), 6% glycerin, 3% butylene glycol, polyethylene glycol- 400 1%, Betaine 1%, Hyaluronic Acid 0.4%, Oat Beta-Glucan 0.2%, Ascorbic Acid (Vitamin C) 0.08%, Tea Polyphenols 0.01%, Sodium Hyaluronate 0.15%, Tremella Fruiting Body Extract 0.15%, Crinkle Carrageen Extract 0.03%, Ginseng Root Extract 0.02%, Hydrolyzed Baobab Extract 0.02%, Centella Asiatica Extract 0.02%, Grape Seed Extract 0.02%, Aloe Vera Gel 0.2 %, Hydrolyzed Collagen 0.1%, Serine 0.01%, Histidine 0.02%, Aspartic Acid 0.04%, Alanine 0.02%, Xanthan Gum 0.05%, Methylparaben 0.05%, Carbomer 0.1%, Seaweed Sugar 0.2%, Disodium EDTA 0.05%, Hydroxypropylmethylcellulose 0.05%, Allantoin 0.1%, Sorbitol 0.1%, Ethylhexylglycerin 0.2%, Polyquaternium-10 0.05%, Hydroxyethylurea 0.5%, Squalane 0.1%, PEG-40 Hydrogenated Castor Oil 0.2%, Ferulic Acid 0.02%, Resveratrol...
Embodiment 2
[0045] The deep-seated cleansing moisturizing facial mask containing the yew leaf extract of the present embodiment has a formula of 0.1% of the southern yew (branch, leaf) extract, 8% of glycerin, 4% of butylene glycol, polyethylene glycol- 400 1%, betaine 1%, hyaluronic acid 0.5%, oat β-glucan 0.3%, ascorbic acid (vitamin C) 0.08%, tea polyphenols 0.01%, sodium hyaluronate 0.25%, white fungus fruiting body extract 0.25%, Crinkle Carrageen Extract 0.03%, Ginseng Root Extract 0.02%, Hydrolyzed Baobab Extract 0.02%, Centella Asiatica Extract 0.02%, Grape Seed Extract 0.02%, Aloe Vera Gel 0.2 %, Hydrolyzed Collagen 0.1%, Serine 0.01%, Histidine 0.02%, Aspartic Acid 0.04%, Alanine 0.02%, Xanthan Gum 0.05%, Methylparaben 0.05%, Carbomer 0.1%, Seaweed Sugar 0.2%, Disodium EDTA 0.05%, Hydroxypropylmethylcellulose 0.05%, Allantoin 0.1%, Sorbitol 0.2%, Ethylhexylglycerin 0.2%, Polyquaternium-10 0.05%, Hydroxyethylurea 0.5%, Squalane 0.1%, PEG-40 Hydrogenated Castor Oil 0.2%, Ferulic ...
Embodiment 3
[0061] The deep-seated cleansing moisturizing facial mask containing the yew leaf extract of the present embodiment has a formula of 0.15% of the northeast yew (twig, leaf) extract, 7% of glycerin, 4% of butylene glycol, polyethylene glycol- 400 1%, betaine 1%, hyaluronic acid 0.5%, oat β-glucan 0.4%, ascorbic acid (vitamin C) 0.08%, tea polyphenols 0.01%, sodium hyaluronate 0.3%, white fungus fruiting body extract 0.3%, Crinkle Carrageen Extract 0.03%, Ginseng Root Extract 0.02%, Hydrolyzed Baobab Extract 0.02%, Centella Asiatica Extract 0.02%, Grape Seed Extract 0.02%, Aloe Vera Gel 0.2 %, Hydrolyzed Collagen 0.1%, Serine 0.01%, Histidine 0.02%, Aspartic Acid 0.04%, Alanine 0.02%, Xanthan Gum 0.05%, Methylparaben 0.05%, Carbomer 0.1%, Seaweed Sugar 0.2%, Disodium EDTA 0.05%, Hydroxypropylmethylcellulose 0.05%, Allantoin 0.1%, Sorbitol 0.3%, Ethylhexylglycerin 0.2%, Polyquaternium-10 0.05%, Hydroxyethylurea 0.5%, Squalane 0.1%, PEG-40 Hydrogenated Castor Oil 0.2%, Ferulic Ac...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com