Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Detection method of pupil surface transmittance distribution of lithography equipment

A technology of lithography equipment and detection method is applied in the field of detection of transmittance distribution of pupil plane, which can solve the problems of long detection time and complicated operation, and achieve the effects of short detection time, guaranteed imaging contrast, and convenient detection process.

Active Publication Date: 2021-11-12
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a method for detecting the pupil transmittance distribution of lithography equipment, so as to solve the problems of the existing detection methods which are cumbersome to operate and take a long time to detect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Detection method of pupil surface transmittance distribution of lithography equipment
  • Detection method of pupil surface transmittance distribution of lithography equipment
  • Detection method of pupil surface transmittance distribution of lithography equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0052] The core idea of ​​the present invention is to provide a method for detecting the pupil transmittance distribution of a lithographic equipment, including:

[0053] Provide a variety of phase mask patterns;

[0054]A light beam is provided by an illumination system, and the light beam is sequentially passed through each phase mask pattern to project a first-level sub-beam and a second-level sub-beam, wherein the second-level sub-beams projected by different phase mask patterns correspond to at different locations on the object plane;

[0055] obtaining object plane pupil information of the first-order sub-beams and the second-order sub-beams projected by each phase mask pattern before passing through the objective lens system;

[0056] The first-order sub-beams and the second-order sub-beams projected from each phase mask pattern are sequentially passed through the objective lens system to be projected onto the image plane, and the first-order sub-beams and the second-o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method for detecting the pupil surface transmittance distribution of a lithographic equipment. Provide a variety of phase mask patterns, and make the second-level sub-beams projected from different phase mask patterns correspond to different positions on the pupil surface of the imaging system, so that multiple detections on the pupil surface of the imaging system can be detected The pupil transmittance detection is carried out at each point, and then the transmittance distribution of the entire pupil surface is obtained. That is, the detection method of the distribution of pupil surface transmittance provided by the present invention has a convenient detection process and a short detection time, which is beneficial to realize the detection process of the lithography equipment in a short period, and to monitor the light intensity of the lithography equipment in a timely manner. Pupil transmittance status.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a method for detecting pupil transmittance distribution of photolithography equipment. Background technique [0002] With the development of projection lithography technology, the performance of the projection optical system of lithography equipment has been gradually improved. At present, lithography equipment has been successfully applied in the field of integrated circuit manufacturing with submicron and deep submicron resolution. And, in order to adapt to the technological requirements of integrated circuit manufacturing breaking through 45nm, 32nm and 22nm technology nodes, lithography equipment must also improve its imaging resolution, and one of the ways to improve imaging resolution is to increase the objective lens system of lithography equipment. Numerical aperture NA, however, using an objective system with a large numerical aperture will cause the effect of the...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70308G03F7/70591G03F7/7085
Inventor 孙文凤
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com