Ultra-pure cadmium rod cleaning device and method

Abstract

The invention relates to the technical field of machine manufacturing and metal cleaning, in particular to an ultra-pure cadmium rod cleaning device and method. The cleaning device is of a closed ventilation structure and comprises an acid liquor cleaning cabin, a pure water cleaning cabin, a high-pressure argon spraying cabin, a conveying roller and a PLC center control panel, the acid liquor cleaning cabin, the pure water cleaning cabin and the high-pressure argon spraying cabin communicate with one another, the conveying roller sequentially penetrates through the acid liquor cleaning cabin,the pure water cleaning cabin and the high-pressure argon spraying cabin from a feeding port, products on the conveying roller sequentially pass through a spraying system of the acid liquor cleaningcabin for acid liquor cleaning, the spraying system of the pure water cleaning cabin carries out pure water flushing, then argon is sprayed by the spraying system of the high-pressure argon spraying cabin for drying, and cleaning is completed. According to the ultra-pure cadmium rod cleaning device and method, metal cleaning conducted manually in the past is replaced, the production efficiency ofhigh-purity metal is improved through the efficient and pollution-free operation, the cleaning rate of metal bars output through the device is high, the labor cost and the safety risk are reduced, andthe final product quality is ensured.

Description

technical field [0001] The invention relates to the technical fields of mechanical manufacturing and metal cleaning, in particular to a cleaning device and method for ultra-high-purity cadmium rods. Background technique [0002] High-purity cadmium (Cd) is mainly used in the preparation of II-VI compound semiconductors, high-purity alloys, batteries, solder and control rods in atomic reactors, solar cells, infrared detectors, etc. Cadmium is easily oxidized in humid air, and the impurities on its surface directly affect its photoelectric properties as photovoltaic materials, photoconductive materials and photosensitive materials. Cadmium is highly toxic, and the air and food polluted by cadmium are seriously harmful to the human body, and its metabolism in the human body is slow. Japan once experienced "itai disease" due to cadmium poisoning. [0003] In the production process of high-purity cadmium rods, the cleaning step is generally done manually. Due to the large batch...

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Problems solved by technology

[0004] Cleaning automation equipment such as CN1326451, which discloses a device for automatically cleaning wafers, uses the principle of chemical mechanical grinding to prepare brushes that can clean the periphery of the back of the wafer, and can be attached to the metal on the peripheral area of ​​the back of the wafer. Particles and carbon particles are removed without further chemical cleaning process, but it cannot clean rod-shaped or other high-purity products of multi-phase crystal planes; cleaning methods such as CN102899674, which discloses a cleaning method for stainless steel parts , can achieve ultra-clean cleaning, but the lack of automation equipment makes the entire cleaning cycle too cumbersome and difficult to achieve

[0005] Existing technology cannot quickly and automatically clean high-purity products with multi-phase crystal surfaces in the form of rods or other shapes. Therefore, we propose a cleaning device and method for ultra-high-purity cadmium rods

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