A dust removal and cleaning device for a mask processing workshop

Abstract

The invention belongs to the technical field of mask processing, in particular to a dust removal and cleaning device for a mask processing workshop. In view of the existing problem of dust accumulation, the following scheme is now proposed, which includes a vacuum chamber, and one side of the vacuum chamber is an opening Structure, a sliding groove is opened on the inner wall of the bottom of the vacuum chamber, a sliding block is slidably installed in the sliding groove, a sliding plate is fixedly installed on the top of the sliding block, the sliding plate is adapted to the vacuum chamber, and both sides of the top of the sliding plate are opened. There is a fixing groove, a dust collecting box is fixedly placed on the sliding plate, a fixing block is fixedly installed on both sides of the bottom of the dust collecting box, and the fixing block is adapted to the fixing groove, and a bottom of the sliding plate is close to the opening. The side opening is provided with a first groove. In the invention, a sliding plate is movably installed at the bottom of the dust collecting box, and a dust removing rod is arranged in the dust removing channel, which greatly cleans the dust remaining in the dust removing channel and the dust collecting box, and avoids danger.

Description

technical field [0001] The invention relates to the technical field of mask processing, in particular to a dust removal and cleaning device for a mask processing workshop. Background technique [0002] A mask is a sanitary product, generally refers to a device worn on the mouth and nose to filter the air entering the mouth and nose to prevent harmful gases, odors, and droplets from entering and leaving the wearer's mouth and nose. It is made of gauze or paper. A dust removal device is required in the mask processing workshop to avoid the presence of dust in the workshop that affects the processing of masks. [0003] The patent with the application number CN202010618274.2 discloses a dust removal device for a mask processing workshop and a method of use, including a bottom dust chamber, the bottom dust chamber is hollow, and the top inner wall of the bottom dust chamber is fixedly installed There are two symmetrically arranged dust removal channels, and suction fans are arra...

AI Technical Summary

Problems solved by technology

[0004] However, when this patent is performing dust removal, the internal dust collection box is fixedly installed in the dust collection room, so that there is a large amount of dust remaining inside the dust collection box each time, and it is not cleaned well in the dust removal channel, resulting in the dust removal after a long time. The effect is greatly reduced, resulting in a large amount of dust remaining in the entire workshop, which is very easy to cause danger

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