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Quantitative and qualitative device and method for impurities in high-purity chlorine trifluoride

A technology for chlorine trifluoride and impurities, applied in the field of quantitative and qualitative devices for impurities in high-purity chlorine trifluoride, to achieve the effect of direct separation

Active Publication Date: 2021-06-11
FUJIAN DEER TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, this method cannot effectively perform qualitative and quantitative analysis on these types of corrosive gases.

Method used

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  • Quantitative and qualitative device and method for impurities in high-purity chlorine trifluoride
  • Quantitative and qualitative device and method for impurities in high-purity chlorine trifluoride
  • Quantitative and qualitative device and method for impurities in high-purity chlorine trifluoride

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Embodiment Construction

[0029] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments It is some embodiments of the present invention, but not all of them. Based on the implementation manners in the present invention, all other implementation manners obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention. Accordingly, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the invention. Based on the implementation manners in the present invention, all other implement...

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Abstract

The invention provides a quantitative and qualitative device and method for impurities in high-purity chlorine trifluoride. The device comprises a switching unit, wherein the switching unit comprises an air inlet pipeline, an air outlet pipeline, a six-way valve, a first four-way valve and a second four-way valve, the six-way valve comprises a valve a to a valve f, the first four-way valve comprises a valve g, a valve h, a valve i and a valve j, and the second four-way valve comprises a valve k, a valve l, a valve m and a valve n, the air inlet pipeline and the air outlet pipeline are respectively connected with the valve a and the valve b; a quantitative cup two ends of which are respectively connected with the valve c and the valve f; a carrier gas unit respectively connected with the valve e, the valve i and the valve m; a separation unit which comprises a fluoroether oil column of which two ends are respectively connected with the valve d and the valve g, a first molecular sieve of which two ends are respectively connected with the valve j and the valve k, and a second molecular sieve connected with the valve l; and an analysis unit which comprises a first TCD connected with the valve h, a second TCD connected between the first molecular sieve and the valve k, and a PDD connected with the second molecular sieve.

Description

technical field [0001] The invention relates to a quantitative and qualitative device and method for impurities in high-purity chlorine trifluoride, in particular to a device and method for quantitative and qualitative impurities in high-purity chlorine trifluoride by gas chromatography. Background technique [0002] Chlorine trifluoride is a toxic and highly corrosive compound. At present, although the synthesis technology of industrial-grade chlorine trifluoride is available in China, there is no mature analysis method for impurities in chlorine trifluoride. Internationally, the impurity analysis method of chlorine trifluoride is mainly to analyze non-corrosive gas components (oxygen, nitrogen, carbon tetrafluoride, etc.) after removing corrosive gases. These non-corrosive gas components are impurity components. This method has great defects, because in the production process of chlorine trifluoride, in addition to chlorine trifluoride, there may also be corrosive gases s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N30/02G01N30/20G01N30/66G01N30/72
CPCG01N30/02G01N30/20G01N30/66G01N30/72G01N2030/201
Inventor 李纪明杨建中陈施华华小林杜勇
Owner FUJIAN DEER TECH CORP