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50 results about "Chlorine trifluoride" patented technology

Chlorine trifluoride is an interhalogen compound with the formula ClF₃. This colorless, poisonous, corrosive, and extremely reactive gas condenses to a pale-greenish yellow liquid, the form in which it is most often sold (pressurized at room temperature). The compound is primarily of interest as a component in rocket fuels, in plasmaless cleaning and etching operations in the semiconductor industry, in nuclear reactor fuel processing, and other industrial operations.

Purification method of chlorine trifluoride

The invention discloses a purification method of chlorine trifluoride, and belongs to the field of fine chemical engineering. The purification method comprises the following steps: introducing chlorine trifluoride crude products into a tower kettle of a rectifying tower; performing vacuum-pumping on the rectifying system, starting to heat the tower kettle after the vacuum degree is stable, and performing total refluxing for 3-15 h to enable the impurity composition of which the boiling point is lower than that of chlorine trifluoride to be gathered at the top of the rectifying tower; when the temperature of the tower kettle is at a temperature of 0-5 DEG C, the temperature of the rectifying tower top is 2-3 DEG C below zero, then collecting front cut fraction at a reflux ratio of 30-300 and condensing and recovering; when the temperature of the tower kettle is 5-8 DEG C, the temperature of the rectifying tower top is 3-6 DEG C, collecting medium fraction at a reflux ratio of 10-90, and condensing and recovering; when the temperature of the tower kettle increases for 2 DEG C, that is, the temperature is 7-10 DEG C, the temperature of the rectifying tower top is 5-8 DEG C, collecting after cut fraction at a reflux ratio of 15-140, and condensing and recovering; when the temperature of the tower kettle is higher than or equal to 15 DEG C, stopping collecting after cut fraction, stopping heating, stopping vacuum-pumping, and finishing rectifying, wherein the medium fraction is the chlorine trifluoride refined product. The method is simple to operate and is high in purification efficiency.
Owner:PERIC SPECIAL GASES CO LTD

Dynamic high-temperature continuous microwave roasting equipment

The invention relates to dynamic high-temperature continuous microwave roasting equipment, and belongs to the technical field of high-temperature microwave roasting equipment for intermediate material high-temperature sintering and roasting and chlorine trifluoride removal and capable of realizing automatic continuous production in the metallurgical and material industries. The dynamic high-temperature continuous microwave roasting equipment comprises a rack, a furnace body, a microwave heating system, a temperature measurement system, a feeding system, a discharging system, a cooling system, a PLC (programmable logic control) device and a double-helix stirring device, wherein the microwave heating system, the temperature measurement system, the feeding system, the discharging system, the cooling system and the double-helix stirring device are arranged on the furnace body; the double-helix stirring device comprises a blade consisting of an outer helix and an inner helix; the microwave heating system, the temperature measurement system, the feeding system, the discharging system, the cooling system and the PLC device are connected. The equipment is simple in structure, high in automation degree, efficient, clean, convenient and low in cost, and can be used for continuous large-scale production.
Owner:KUNMING UNIV OF SCI & TECH

Preparation method of lithium difluoro(oxalato)borate

The invention discloses a preparation method of lithium difluoro(oxalato)borate. The method comprises the following steps: adding lithium oxalate and anhydrous HF to a fluorine lining reaction kettle, and fully stirring to make lithium oxalate be fully dissolved in HF; introducing a boron trifluoride gas to the reaction kettle, controlling the flow velocity of boron trifluoride to be 0.5-2L/min, the reaction temperature to be 0-90DEG C, the reaction pressure to be 0-0.5MPa and the molar ratio of boron trifluoride to lithium oxalate to be 2.2-2:1, continuously stirring and reacting for 2-24h after introduction of the boron trifluoride gas is finished, and evaporating and crystallizing the above obtained reaction product o obtain crude lithium difluoro(oxalato)borate; and fast drying, adding an organic solvent, dissolving, filtering, and drying to obtain the lithium difluoro(oxalato)borate product, wherein the organic solvent adopts one or more of esters, ethers, alcohols and nitriles, the use amount of the organic solvent guarantees that lithium tetrafluoroborate can be completely dissolved in the organic solvent, and lithium difluoro(oxalato)borate cannot be completely dissolved in the organic solvent. The method is simple and practical, and can realize large-scale industrial production of lithium difluoro(oxalato)borate.
Owner:CNOOC TIANJIN CHEM RES & DESIGN INST +1

Device for gas linear cutting of silicon slice

The invention discloses a device for the gas linear cutting of a silicon slice, which comprises a flow controller, a pressure reducing valve, a pressure gauge, a vacuum pump, a vacuum-cavity pressure gauge, a vacuum-cavity temperature control device, a vacuum chamber, a spray head, a masking plate, a silicon slice frame, a post pump and a tail gas processing device, wherein the pressure reducing valve, the vacuum pump, the vacuum-cavity pressure gauge, the vacuum-cavity temperature control device and the post pump are respectively connected with the vacuum chamber, gas enters the vacuum chamber after sequentially passing through the flow controller, the pressure reducing valve and the spray head, then the silicon slice on the silicon slice frame is cut through the masking and the beam convergence and regulation of the masking plate, the temperature of the vacuum chamber is controlled to be under a room temperature environment through the vacuum-cavity temperature control device, and etched tail gas is pumped out of the vacuum chamber through the post pump and enters the tail gas processing device through the post pump. In the invention, chlorine trifluoride is used as etching reaction gas for carrying out cutting processing for the silicon slice, and the problems existing in a traditional technology can be well solved.
Owner:INST OF MICROELECTRONICS CHINESE ACAD OF SCI

Low temperature preparation method of boron trifluoride dimethyl carbonate complex compound

The invention belongs to a chemical engineering product, a boron trifluoride dimethyl carbonate complex compound, in particular relates to a low temperature preparation method of the boron trifluoride dimethyl carbonate complex compound. The preparation method comprises the following steps: in a gas generating container, using boric acid and anhydrous hydrofluoric acid as raw materials, dehydrating and generating boron trifluoride gas, and sulfur trioxide is used as an dehydrating agent; in a purification container, purifying the boron trifluoride gas generated through concentrated sulphuric acid; in a complexing container, performing a complexing reaction of the purified boron trifluoride gas and the dimethyl carbonate; and in a filter, cooling down and crystallizing the liquid reactant of the complexing reaction, and the solid gathered is the boron trifluoride dimethyl carbonate complex compound. The technical scheme provided by the invention enables the temperature of the gas generating reaction and complexing reaction to be close to the room temperature, decreases energy consumption during production process and is low-carbon and environment friendly; the production process is safer and more controllable; and the boron trifluoride dimethyl carbonate complex compound is a solid white crystal, wherein the content of boron trifluoride is 40-43 percent in weight and the property of the boron trifluoride is stable.
Owner:SHANDONG HEYI GAS CO LTD DONGYING CITY +1

High-concentration chlorine trifluoride tail gas treatment device and treatment method

The invention discloses a high-concentration chlorine trichloride tail gas treatment device which comprises a dilution system, a dry treatment system and a spray system which are sequentially connected. The dilution system comprises a venturi vacuum generator and a nitrogen source. The venturi vacuum generator is provided with an adsorption chamber inlet and a compressed gas inlet, the adsorptionchamber inlet is connected with an exhaust gas source, a one-way check valve is arranged between the adsorption chamber inlet and the exhaust gas source; the compressed gas inlet is connected with thenitrogen source; the dry treatment system includes a pretreatment device and a main treatment device, the gas inlet end of the pretreatment device is connected to the gas outlet end of the venturi vacuum generator, and the gas intake end of the main treatment device is connected to the outlet end of the pretreatment device, and the pretreatment device and the main treatment device have the same structure, both includes a casing, and the casing is filled with an alkaline reactant. The invention also discloses a high-concentration chlorine trichloride tail gas treatment method, and the high-concentration chlorine trichloride tail gas treatment method has the advantages of prevention of backflow and high safety of completion of chlorine trifluoride gas absorption treatment after gradient dilution and reaction.
Owner:QUANJIAO NANDA PHOTOELECTRIC MATERIAL

Production technological method for boron trifluoride acetonitrile complex solid mixture

The invention belongs to the field of chemical technologies, and particularly relates to a production technological method for a boron trifluoride acetonitrile complex solid mixture. The method aims at solving the problems that the existing production process flow is relatively simple, the yield of finished products is relatively small, the resource waste is easily caused, in addition, the waste gas treatment link and the solid recovery link do not exist in the production process, the pollution to the environment is caused, the environmental protection purpose is not achieved, and the like. According to the method, boric acid solid and fuming sulfuric acid liquid are uniformly mixed, a gas-making reaction tower is preheated for 10 minutes through a heater, the temperature is controlled tobe within 200-300 DEG C, mixed acid of the boric acid solid and the fuming sulfuric acid liquid is added into the gas-making reaction tower from the top, and meanwhile, hydrogen fluoride gas is compressed and then is added into the gas making reaction tower from the bottom. The method has the advantages that the yield of the finished products is increased, the resource waste is avoided, the wastegas treatment link and the solid recovery link are increased, the pollution to the environment is avoided, and the environmental protection purpose is achieved.
Owner:珠海市格特生物科技有限公司
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