High-concentration chlorine trifluoride tail gas treatment device and treatment method

A chlorine trifluoride and tail gas treatment technology, which is applied in gas treatment, chemical instruments and methods, separation methods, etc., can solve problems such as backflow, and achieve the effects of avoiding treatment, high safety, and strong applicability

Inactive Publication Date: 2018-12-18
QUANJIAO NANDA PHOTOELECTRIC MATERIAL
View PDF4 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is: the high-concentration chlorine trifluoride gas cannot be directl

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-concentration chlorine trifluoride tail gas treatment device and treatment method
  • High-concentration chlorine trifluoride tail gas treatment device and treatment method
  • High-concentration chlorine trifluoride tail gas treatment device and treatment method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] In order to facilitate those skilled in the art to understand the technical solution of the present invention, the technical solution of the present invention will be further described in conjunction with the accompanying drawings.

[0020] refer to figure 1 , a high-concentration chlorine trifluoride tail gas treatment device disclosed in this embodiment includes a tail gas source 1 , a dilution system 2 , a dry treatment system 3 and a spray system 4 .

[0021] The tail gas source 1 in this embodiment is chlorine trifluoride cylinder gas, such as the residual cylinder gas left over from the etching process in the integrated circuit industry.

[0022] The dilution system 2 includes a Venturi vacuum generator 21 and a nitrogen source 22, and the Venturi vacuum generator 21 is provided with an adsorption chamber inlet (not shown in the figure) and a compressed gas inlet (not shown in the figure), The inlet of the adsorption chamber is connected to the steel cylinder, an...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a high-concentration chlorine trichloride tail gas treatment device which comprises a dilution system, a dry treatment system and a spray system which are sequentially connected. The dilution system comprises a venturi vacuum generator and a nitrogen source. The venturi vacuum generator is provided with an adsorption chamber inlet and a compressed gas inlet, the adsorptionchamber inlet is connected with an exhaust gas source, a one-way check valve is arranged between the adsorption chamber inlet and the exhaust gas source; the compressed gas inlet is connected with thenitrogen source; the dry treatment system includes a pretreatment device and a main treatment device, the gas inlet end of the pretreatment device is connected to the gas outlet end of the venturi vacuum generator, and the gas intake end of the main treatment device is connected to the outlet end of the pretreatment device, and the pretreatment device and the main treatment device have the same structure, both includes a casing, and the casing is filled with an alkaline reactant. The invention also discloses a high-concentration chlorine trichloride tail gas treatment method, and the high-concentration chlorine trichloride tail gas treatment method has the advantages of prevention of backflow and high safety of completion of chlorine trifluoride gas absorption treatment after gradient dilution and reaction.

Description

technical field [0001] The invention belongs to the technical field of tail gas treatment, and in particular relates to a high-concentration chlorine trifluoride tail gas treatment device and a treatment method. Background technique [0002] Chlorine trifluoride is a highly toxic and strong oxidizing medium, which can react with almost all inorganic materials. Corrosion of inorganic materials, combustion process, especially the intermediate product oxychloride are the key factors for explosion initiation. Chlorine trifluoride was originally used as an oxidant for rocket propellants. A 900Kg leakage accident in the United States caused violent combustion and explosion of concrete buildings, resulting in heavy casualties. The accident once became a classic case of combustion, and also prompted technicians in this field to conduct in-depth research on chlorine trifluoride storage containers and media. At the same time, chlorine trifluoride is also widely used in the recovery ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B01D53/68B01D53/78B01D53/81
CPCB01D53/68B01D53/685B01D53/78B01D2251/304B01D2251/306B01D2251/404B01D2251/604B01D2257/204
Inventor 朱颜王陆平王仕华黄磊王智
Owner QUANJIAO NANDA PHOTOELECTRIC MATERIAL
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap