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Method for preparing chlorine trifluoride

A technology of chlorine trifluoride and fluorine gas, applied in the direction of interhalogen compounds, etc., can solve the problems affecting the safety and yield of chlorine trifluoride, high requirements for corrosion resistance and high temperature resistance of equipment, high reaction temperature and reaction pressure, etc. Achieve the effects of easy control of temperature and pressure, enhanced reactivity, and continuous reaction process

Pending Publication Date: 2021-04-30
SICHUAN HONGHUA IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The advantage of this method is that the reaction is a one-step catalytic synthesis, and the disadvantage is that the reaction needs to add a catalyst and the reaction pressure is relatively high.
[0009] In summary, the currently known preparation methods of chlorine trifluoride are mainly gas-solid reaction, gas-liquid reaction, gas-gas catalytic synthesis reaction, etc., which have high reaction temperature and reaction pressure, complex process, and poor corrosion resistance of equipment. The high temperature requirements are high, and the process is difficult to control, which affects the safety and yield of the preparation of chlorine trifluoride, making it difficult to industrialize large-scale production

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] The method for preparing chlorine trifluoride in the next step without catalyst under normal pressure, the specific steps of the method are as follows:

[0030] Step (1), use nitrogen to purge the system, use fluorine gas with a purity of 98.5% and chlorine gas with a purity of 99.9%, the molar ratio of fluorine gas to chlorine gas is 3:1, and preheat the fluorine gas to 100°C respectively , the chlorine gas is preheated to 100°C; the preheated fluorine gas and chlorine gas enter the reactor mixing chamber and mix, then enter the reactor, and react at a temperature of 250°C and a pressure of 0 MPa (gauge pressure) to obtain chlorine trifluoride mixed gas.

[0031] Step (2), chlorine trifluoride mixed gas enters the condenser, condenses at -35°C to obtain condensed liquid, i.e. crude chlorine trifluoride; after condensation, non-condensable low boiling point gas impurities, such as ClF, ClO 2 F, F 2 The gas is sent to the tail gas purification system through the gas ph...

Embodiment 2

[0034] The method for preparing chlorine trifluoride in the next step without catalyst under normal pressure, the specific steps of the method are as follows:

[0035] Step (1), use nitrogen to purge the system, use fluorine gas with a purity of 98.8% and chlorine gas with a purity of 99.95%, the molar ratio of fluorine gas to chlorine gas is 3.2:1, and preheat the fluorine gas to 160°C respectively , the chlorine gas is preheated to 160°C; the preheated fluorine gas and chlorine gas enter the reactor mixing chamber and mix, then enter the reactor, and react at a temperature of 320°C and a pressure of 0.008MPa (gauge pressure) to obtain trifluoride Chlorine mixture.

[0036] Step (2), chlorine trifluoride mixed gas enters the condenser, condenses at -25°C to obtain condensed liquid, i.e. crude chlorine trifluoride; after condensation, low boiling point gas impurities, such as ClF, ClO 2 F, F 2 The gas is sent to the tail gas purification system through the gas phase outlet p...

Embodiment 3

[0039] The method for preparing chlorine trifluoride in the next step without catalyst under normal pressure, the specific steps of the method are as follows:

[0040] Step (1), use nitrogen to purge the system, use fluorine gas with a purity of 99% and chlorine gas with a purity of 99.99%, the molar ratio of fluorine gas to chlorine gas is 3.5:1, and preheat the fluorine gas to 200°C respectively , the chlorine gas is preheated to 200°C; the preheated fluorine gas and chlorine gas enter the reactor mixing chamber and mix, then enter the reactor, and react at a temperature of 350°C and a pressure of 0.01MPa (gauge pressure) to obtain trifluoride Chlorine mixture.

[0041] Step (2), the chlorine trifluoride mixed gas enters the condenser, and is condensed at -20°C to obtain the condensed liquid, that is, the crude chlorine trifluoride; after condensation, the low boiling point gas impurities, such as ClF, ClO 2 F, F 2The gas is sent to the tail gas purification system through...

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Abstract

The invention belongs to the technical field of inorganic fluorine chemical industry, and particularly relates to a method for preparing chlorine trifluoride, which comprises the following steps: respectively preheating fluorine gas and chlorine gas, sufficiently mixing, and reacting at normal pressure to obtain chlorine trifluoride mixed gas; condensing the chlorine trifluoride mixed gas to obtain a chlorine trifluoride crude product; and rectifying, purifying and condensing the chlorine trifluoride crude product to obtain a chlorine trifluoride product. According to the method, chlorine trifluoride can be prepared in one step under the conditions of no catalyst and normal pressure, the process operation is simple, the reaction time is short, the temperature and pressure are easy to control, the reaction process is safe, and industrial production can be realized.

Description

technical field [0001] The invention belongs to the technical field of inorganic fluorine chemical industry, and in particular relates to a method for preparing chlorine trifluoride. Background technique [0002] Chlorine trifluoride is a colorless corrosive gas or light yellow liquid with a liquid density of 1.825g / cm 3 , melting point -76.34, boiling point 11.75°C. Soluble in anhydrous hydrogen fluoride, carbon tetrachloride, etc. Chlorine trifluoride is a strong oxidizing agent with high chemical reactivity and flammability. It can react explosively with water and organic compounds and is a hazardous chemical. [0003] In recent years, with the rapid development of semiconductor, liquid crystal, solar energy and LED industries, chlorine trifluoride has been widely used in the CVD (chemical vapor deposition chamber) cleaning process, and the demand is on the rise. Chlorine trifluoride It has become one of the key specialty gases in the IC industry. High-purity chlorine...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B7/24
CPCC01B7/24
Inventor 丁勇张堃梁战军汤鲲彪陈功俊赵彬
Owner SICHUAN HONGHUA IND
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