Semiconductor device and manufacturing method thereof
A semiconductor and device technology, applied in the field of semiconductor devices and their manufacturing, can solve difficult design and manufacturing problems
Pending Publication Date: 2021-06-29
TAIWAN SEMICON MFG CO LTD +2
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AI-Extracted Technical Summary
Problems solved by technology
The invention relates to a semiconductor device and a manufacturing method thereof. The semiconductor device includes: a substrate; a first gate structure, a second gate structure and a third gate structure; and a first source/drain region. The first gate structure, the second gate structure and the third gate structure are over the substrate and arranged along a first direction. The first gate structure, the second gate structure and the third gate structure extend in a second direction different from the first direction, and the second gate structure is between the first gate structure and the third gate structure. The first source/drain region is between the first gate structure and the third gate structure and at one end of the second gate structure.
TransistorSolid-state devices +3
EngineeringDevice material +3
- Experimental program(20)
Description & Claims & Application Information
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