Multi-strategy obstacle avoidance logic and control method for Mars landing

A control method and multi-strategy technology, applied in attitude control, non-electric variable control, control/regulation system, etc., can solve problems such as complex timing, complex and variable, and large dynamic range, and achieve fast obstacle avoidance tasks and soft landings Effect that the probability of success improves

Pending Publication Date: 2022-01-04
BEIJING INST OF CONTROL ENG
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Different from the re-entry process of the earth's atmosphere and the landing process of the moon, the Mars EDL process takes a very short time (about 7 to 9 minutes), while the ground measurement and control time delay is large (more than ten minutes), which requires the detector to be fully autonomous during the landing process. ; The atmospheric environment of Mars is complex and changeable, the entry status of the entry cabin, aerodynamic parameters, etc. have great uncertainty, the entire EDL process has a complex timing sequence and a large dynamic range, which will cause a large landing point error. At the same time, the Martian surface terrain is complex and There is no high-resolution prior data of the topography of the landing zone, so the detector is required to be able to autonomously and quickly identify and avoid obstacles during the landing process, and to have the ability to land safely in complex terrain

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Multi-strategy obstacle avoidance logic and control method for Mars landing
  • Multi-strategy obstacle avoidance logic and control method for Mars landing
  • Multi-strategy obstacle avoidance logic and control method for Mars landing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0059] In order to make the object, technical solution and advantages of the present invention clearer, the implementation manner of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0060] During the landing process, the back cover avoidance, landing area obstacle recognition and avoidance tasks of the landing platform are jointly completed by the Entry, Descent Control Unit, EDCU, optical obstacle avoidance sensor and multifunctional obstacle avoidance sensor. Among them, the EDCU contains the control computer board and the main / backup image processing board, etc., and is the core controller of the landing process, used for attitude and orbit control calculation, multi-functional obstacle avoidance sensor and optical obstacle avoidance sensor image data during landing processing and safe point solving, etc. The multifunctional obstacle avoidance sensor includes a laser three-dimensional imaging module and an opti...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A multi-strategy obstacle avoidance logic and control method for Mars landing adopts a cooperative control strategy of coarse obstacle avoidance and parachute-back cover combination avoidance for a new requirement of unified avoidance of a parachute-back cover combination and landform obstacles in the aspect of control strategy. In a hovering fine obstacle avoidance stage, on the basis of laser three-dimensional imaging, a redundancy strategy of binocular fine obstacle avoidance by using an optical obstacle avoidance sensor and a multifunctional obstacle avoidance sensor optical obstacle avoidance module is added. According to the strong time sequence requirements of mars in the entering, descending and landing processes, working time sequences of data transmission, information interaction and the like among an entering and descending control unit, a multifunctional obstacle avoidance sensor and a optical obstacle avoidance sensor are provided, and it is guaranteed that the obstacle avoidance task is completed autonomously and rapidly in a short time.

Description

technical field [0001] The invention relates to a multi-strategy obstacle avoidance logic and control method for Mars landing, in particular to a logic and timing control method for detecting and avoiding obstacles during the Mars soft landing process, belonging to the soft landing control of extraterrestrial celestial bodies technology field. Background technique [0002] The Mars entry, descent and landing (Entry, Descent and Landing, EDL) process starts from the probe's contact with the entry point of the Martian atmosphere and ends with a safe landing on the surface of Mars. It mainly includes key stages such as aerodynamic deceleration, parachute deceleration and dynamic deceleration, such as figure 1 shown. The technology involved in the present invention is mainly used in the power deceleration stage. This stage can be further divided into stages such as power avoidance, hovering imaging, obstacle avoidance maneuvering, and slow descent. The evasion of the cover as...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G05D1/08
CPCG05D1/0833
Inventor 刘旺旺赵宇王晓磊徐李佳王云鹏郝策陈尧杨晓龙华宝成朱飞虎李涛张琳
Owner BEIJING INST OF CONTROL ENG
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products