Fin FET devices from bulk semiconductor and method for forming

Abstract

The present invention thus provides a device structure and method for forming fin Field Effect Transistors (FETs) that overcomes many of the disadvantages of the prior art. Specifically, the device structure and method provides the ability to form finFET devices from bulk semiconductor wafers while providing improved wafer to wafer device uniformity. Specifically, the method facilitates the formation of finFET devices from bulk semiconductor wafers with improved fin height control. Additionally, the method provides the ability to form finFETs from bulk semiconductor while providing isolation between fins and between the source and drain region of individual finFETs. Finally, the method can also provide for the optimization of fin width. The device structure and methods of the present invention thus provide the advantages of uniform finFET fabrication while using cost effect bulk wafers.

Description

technical field [0001] The present invention relates to the field of semiconductor fabrication and, in particular, to methods of fabricating fin field effect transistors. Background technique [0002] Competing demands to reduce cost and increase performance in the production of semi-devices are driving ever-increasing device densities within integrated circuits. In order to increase device density, there is a constant need for new techniques to reduce the physical size of these semiconductor devices. [0003] The need to increase device density is particularly strong in CMOS technologies such as the design and fabrication of field effect transistors (FETs). FETs include the main components of CMOS. Scaling FETs to achieve higher device densities in CMOS can result in reduced performance and / or reliability. [0004] One type of FET that has been proposed to facilitate increased device density is the fin field effect transistor (fin Field Effect Transistor). In a finFET, ...

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Problems solved by technology

[0008] Also, Hisamoto's process does not provide a way to control fin height

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