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Polarizing reticle

A polarization grating and polarization technology, applied in the field of polarization grating, can solve the problems of establishing different processing conditions and providing the required equipment.

Inactive Publication Date: 2006-03-15
SK HYNIX INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, given the current state of the art, this presents difficulties in establishing the required different processing conditions and in providing the required equipment

Method used

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  • Polarizing reticle
  • Polarizing reticle
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Examples

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Embodiment Construction

[0019] Hereinafter, the present invention will be described in detail with reference to the accompanying drawings and exemplary embodiments so that those skilled in the art can easily implement the present invention. However, the invention is not limited to the illustrated embodiments, and other embodiments may be implemented.

[0020] In order to clearly define the layers and regions described in the following description, these layers and regions are shown in an exaggerated state in the drawings, especially in terms of thickness.

[0021] The polarization grating according to the exemplary embodiment of the present invention will refer to figure 1 Detailed Description.

[0022] figure 1 A cross-sectional view illustrating a polarization grating according to a first embodiment of the present invention. Such as figure 1 As shown, the polarizing grating includes a transparent substrate 100, and covering the substrate 100, a polarizing filter 110 having a desired orientation...

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Abstract

A polarizing reticle including a transparent substrate, a polarizing filter formed over the transparent substrate, and a mask pattern formed on the polarizing filter. The polarizing reticle can polarize illumination light incident thereto in a desired direction in a photolithography process.

Description

technical field [0001] The present invention relates to a grating, and more particularly, to a polarizing grating that enables illumination light incident thereon to be polarized in a desired direction during a photolithographic process. Background technique [0002] With the recent tendency to provide semiconductor devices with higher integration and higher density, active research has been conducted to develop photolithography capable of forming micropatterns of further reduced size. At the same time, high resolution and high depth of focus (DOF) are required for the manufacture of highly integrated devices. [0003] For this purpose, conventional photolithography techniques include immersion techniques. In this case, however, an excessive increase in numerical aperture (NA) may occur. [0004] When NA is excessively increased, DOF may conversely decrease. Also, in this case, the resolution is not significantly increased. For this reason, research is currently being co...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/28G03F7/20
CPCG02B5/3033G03F1/14G03F1/26G03F1/34G03F1/38G03F1/62
Inventor 梁起豪姜春守
Owner SK HYNIX INC