Low-luster polishing agent combination and preparation method thereof
A technology of polishing agent and composition, which is applied in the field of low-gloss polishing agent composition and its preparation, which can solve the problems of leveling decline, drag marks or brush marks, etc., and achieve the effect of solving leveling problems
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Publication Date
- 2009-04-15
- Estimated Expiration
- Not applicable · inactive patent
Abstract
Description
technical field
[0001] The invention relates to the technical field of chemical industry, in particular to a low-gloss polishing agent composition and a preparation method thereof. Background technique
[0002] Polishing agents are widely used in the coating of various material surfaces to modify, repair and protect the surfaces of these materials, and selectively increase the water resistance, wear resistance, slip resistance, stain resistance and other properties of the surfaces of these materials. A polish or wax can often be applied to an old surface to renew the surface and restore gloss. Such polishes are often associated with glossy, ie, high-gloss, surfaces, and when a polish is applied to an old surface, the gloss or brilliance of the surface increases significantly.
[0003] Commercially available traditional polishes generally require a smooth and clean surface while applying a high-gloss coating to objects such as floors, furniture, and shoes. Car polishes are ...
Examples
Embodiment 1
[0036] Mix the components in Table 1 as follows:
[0037] Table 1
[0038] composition
Dosage
role
Deionized water
28.74
solvent
Ammonium perfluoroalkanesulfonate (1%) Note 1
0.85
lubricant
Diethylene glycol monoethyl ether
4.83
Coalescent
Dibutyl phthalate
1.24
Plasticizer
Tributoxyethyl phosphate
2.26
leveling agent
Styrene / acrylic copolymer emulsion (38%)
42.14
film former
Polycarboxylate / styrene salt emulsion (38%) Note 2
2.62
Alkali-soluble resin
Polyethylene Wax Emulsion (35%)
2.28
Wax Emulsion
Silicone Oil Note 3
0.04
defoamer
total
85.00
[0039] Note 1: The trade name is FC-120, provided by 3M Company;
[0040] Note 2: The trade name is ASR Plus, provided by Rohm and Haas;
[0041] Note 3: The trade name is SWS-211, provided by Wacker Company.
[0042] Under the action of slo...
Embodiment 2
[0051] In the same way as in Example 1, mixture A was obtained.
[0052] Mix the components in Table 3 with Example 1 to obtain Predispersion 2:
[0053] table 3
[0054] composition
Dosage
role
Deionized water
13.40
carrier
Ammonia (28%)
0.03
pH adjuster
Sodium polyacrylate
0.07
Dispersant
Silica (TS-100) Note 5
1.5
Matting agent
total
15.00
[0055] Note 5: The trade name TS-100 is provided by Degussa Company.
[0056] As in Example 1, the low gloss polishing agent composition 2 can be obtained by mixing the pre-dispersion 2 with the mixture A uniformly.
Embodiment 3
[0058] Mix the components in Table 4 with Example 1 to obtain Mixture B:
[0059] Table 4
[0060] composition
[0061] Silicone oil note 8
[0062] Note 6: Trade name TEGOPREN-5840, provided by Degussa;
[0063] Note 7: The trade name is ASR Plus, provided by Rohm and Haas;
[0064] Note 8: The trade name is SWS-211, provided by Wacker Company.
[0065] Mix the components in Table 5 with Example 1 to obtain Predispersion 3:
[0066] table 5
[0067] composition
[0068] In the same way as in Example 1, the pre-dispersion 3 and the mixture B are mixed uniformly to obtain the low-gloss polishing agent composition 3.