Liquid crystal display
A liquid crystal display and substrate technology, applied in static indicators, instruments, nonlinear optics, etc., can solve the problems of uneven distribution of photoresist spacers and poor panel display, and achieve the effect of preventing deviation
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no. 1 example
[0043]Please refer to FIG. 2 and FIG. 3. FIG. 2 is a top view of the scanning line 60 of the liquid crystal display according to the first embodiment of the present invention, and FIG. 3 is a schematic cross-sectional view along A2A2' and B2B2' in FIG. 2 . As shown in FIGS. 2 and 3 , the liquid crystal display of the present invention includes a lower substrate 52 , an upper substrate 54 disposed parallel to the lower substrate 52 , and a liquid crystal molecule layer 58 filled between the lower substrate 52 and the upper substrate 54 . Wherein the lower substrate 52 is a TFT array substrate, and its upper surface includes a plurality of scanning lines 60, a plurality of thin film transistors (not shown) and a plurality of data lines (not shown), to form a plurality of sub-pixels . In addition, the upper substrate 54 of the liquid crystal display is a color filter substrate, including a plurality of color filters 62 arranged on the lower surface of the upper substrate 54, a co...
no. 2 example
[0047] Please refer to FIG. 8 and FIG. 9 , FIG. 8 is a top view of the data line 70 of the liquid crystal display according to the second embodiment of the present invention, and FIG. 9 is a schematic cross-sectional view along A8A8' and B8B8' in FIG. 8 . Like the method of forming the shrinkage pattern 40 or the hollow pattern 42 on the side of the scanning line 60 of the lower substrate 52 in the aforementioned first embodiment, the present invention can also be used on the side of the data line 70 of the lower substrate 52 corresponding to the position of the photoresist spacer 64, respectively. The shrinkage patterns 72 and the hollow patterns 74 are formed, and the arrangement distribution of the shrinkage patterns 72 or the hollow patterns 74 is in a staggered configuration. In an ideal layout design, the width of the indented pattern 72 boundary relative to the data line 70 boundary must also be equal to the size of the distance from the hollow pattern 74 boundary to the...
no. 3 example
[0051] Please refer to FIG. 14 and FIG. 15 , FIG. 14 is a schematic structural diagram of the protrusion pattern and the photoresist spacer according to the third embodiment of the present invention, and FIG. 15 is a top view of the protrusion pattern and the photoresist spacer in FIG. 14 . As shown in FIG. 14 and FIG. 15 , different from the first and second embodiments described above, the present invention can form an additional columnar photoresist spacer 64 in the mask of the lower substrate 52 manufacturing process. The protruding patterns 76 of equal thickness are used to make corresponding contact with the photoresist spacers 64 of equal height on the side of the upper substrate 54 . Similarly, the distance from the boundary of the protrusion pattern 76 to the edge of the photoresist spacer 64 needs to be greater than the assembly offset to overcome the uneven area density of the photoresist spacer 64 caused by the assembly deviation of the upper and lower substrates 54...
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