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Photoresist stripping compound and method for using same for stripping photoresist film

A technology of photoresist and composition, which is applied in the preparation of detergent mixture composition, detergent composition, chemical instrument and method, etc., and can solve the problems such as deterioration of stripping efficiency of photoresist stripping composition

Active Publication Date: 2012-06-06
SAMSUNG DISPLAY CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, when the photoresist stripping composition is used again, the stripping efficiency of the photoresist stripping composition deteriorates

Method used

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  • Photoresist stripping compound and method for using same for stripping photoresist film
  • Photoresist stripping compound and method for using same for stripping photoresist film
  • Photoresist stripping compound and method for using same for stripping photoresist film

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Embodiment 1

[0070] About 93% by weight of γ-butyrolactone, about 5% by weight of methyl carbamate, about 1% by weight of methanesulfonic acid, and about 1% by weight of OP-10 as a nonionic surfactant were mixed to Prepare a photoresist stripping composition.

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Abstract

The invention relates to a composition for stripping photoresist and a method of stripping photoresist using the same. The composition for stripping photoresist comprises about 80% to about 98.5% by weight of gamma-butyrolactone, about 1% to about 10% by weight of alkyl carbamate, about 0.1% to about 5% by weight of alkyl sulfonic acid and about 0.1% to about 5% by weight of nonionic surfactant. The composition for stripping photoresist may be used for stripping photoresist from a substrate without lowering the stripping property or damaging the metal pattern, thus reducing the cost of stripping process.

Description

technical field [0001] The present invention relates to a photoresist stripping composition and a method for stripping a photoresist film using the same. More particularly, the present invention relates to a reusable photoresist stripping composition and a method of stripping a photoresist film using the same. Background technique [0002] Liquid crystal display (LCD) devices display images using optical and electrical properties of liquid crystals, such as anisotropic refractive index and anisotropic dielectric constant. Compared with display devices such as cathode ray tubes (CRTs), plasma display panels (PDPs), etc., LCD devices have characteristics of light weight, low power consumption, low driving voltage, and the like. [0003] Generally, an LCD device includes an LCD panel and a light source that provides light to the LCD panel. The LCD panel includes a thin film transistor (TFT) substrate, a filter substrate, and a liquid crystal layer interposed between the TFT s...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/42
CPCC11D3/044C11D7/266C11D11/0047G03F7/038G03F7/0758G03F7/322G03F7/422G03F7/423G03F7/426
Inventor 洪瑄英朴弘植郑钟铉金俸均申原硕李智鲜李炳珍金炳郁尹锡壹金圣培辛成健许舜范
Owner SAMSUNG DISPLAY CO LTD