Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Technique for quickly cultivating elm landscape

An elm tree and landscape technology, applied in the field of elm landscape rapid cultivation technology, can solve the problems of limited number of mature elm trees, difficult to transplant or cultivate elm trees, difficult to transplant into timber, etc., and achieve the effect of adding infinite cultural connotations.

Inactive Publication Date: 2008-11-12
林侦波
View PDF0 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the number of existing mature elm trees is limited, and there are only a handful of elm trees with a trunk diameter of more than 1 meter. hundreds of years
Therefore, under the existing technical conditions, it is difficult to transplant or cultivate a mature elm tree for most urban high-end residential quarters, parks, or schools, government agencies and other courtyard units. Only left and right can have the landscape effect of ancient trees

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Technique for quickly cultivating elm landscape
  • Technique for quickly cultivating elm landscape
  • Technique for quickly cultivating elm landscape

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] The elm cultivation process includes the following main steps: select 46 elm saplings with a trunk diameter of 2 cm and a height of 1.5 meters, and plant them on the edge of a circular area with a diameter of 1.5 meters, and the planting distance is measured per meter of circular area Plant 10 saplings on the circumference length, and the average spacing of every adjacent two seedlings after planting is about 9.5 centimetres, as figure 1 shown. The so-called "two adjacent saplings" refer to two adjacent saplings at the planting point 10 on the ground; The trunk (the part exposed to the soil 5) is bent into a spiral shape, such as figure 2 shown; and the helical directions of the main trunks of the two groups of saplings are opposite, so that the helical directions of the main trunks of each adjacent two saplings are opposite, that is, looking down from above, among the main trunks of the two adjacent saplings, one of them spirals upwards in a clockwise direction, and ...

Embodiment 2

[0037] The elm cultivation process includes the following main steps: select 34 elm saplings with a trunk diameter of 1.0 cm and a height of 0.8 m, and plant them on the edge of a circular area with a diameter of 0.7 m, and the planting distance is measured per meter of circular area Plant 16 saplings on the length of the circumference. After planting, the average distance between every two adjacent saplings is about 6 cm; All are bent into a spiral shape, and the helical directions of the trunks of the two groups of saplings are opposite, so that the helical directions of the trunks of every two adjacent saplings are opposite. The horizontal projection of the spiral trunk of each sapling is located at the edge of the above-mentioned circular area, and the trunks of all the saplings intersect to form a hollow cylindrical trunk network. The diameter of the cylindrical trunk network is equivalent to the diameter of the above-mentioned circular area, about 0.7 meters about.

[0...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A quick planting process of landscape of elms comprises the following main steps: planting the sapling s of elms on the edge of round region with 0. 5-3m of diameter, wherein the planting distance has a standard for planting 5-20 trees in per 1m of arc length; dividing the saplings into two groups after planting, bending the trunks of two groups of saplings to be helical in different directions, and making the horizontal projection of the helical trunks of each sapling lie at the edge of the round region, wherein the trunks of all saplings cross to form a hollow columned trunk net. The elms of landscape effect can be quickly planted in short time according to the invention.

Description

technical field [0001] The invention relates to a garden planting technique, in particular to an elm landscape rapid cultivation technique. Background technique [0002] The mature elm has a huge crown and a thick trunk, often reaching more than one meter, which is highly artistic, ornamental, and practical; the mature elm planted in the courtyards of high-end residential areas, parks, schools, and government agencies in the city , its landscape effect and cultural connotation are unmatched by other decorations. However, the number of existing mature elm trees is limited, and there are only a handful of elm trees with a trunk diameter of more than 1 meter. hundreds of years. Therefore, under the existing technical conditions, it is difficult to transplant or cultivate a mature elm tree for most urban high-end residential quarters, parks, or schools, government agencies and other courtyard units. Left and right can have the landscape effect of ancient trees. Contents of ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A01G1/00B44C5/06
Inventor 林侦波
Owner 林侦波
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com