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Photo mask verification system and program

A verification system and photomask technology, applied in the field of photomask verification systems, can solve problems such as indication errors, errors prone to occur, etc.

Inactive Publication Date: 2009-03-11
JEDAT
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] Therefore, when making a photomask, the division of the display panel area and the cutting of the display layout data are performed, and the exposure elements of the photomask are made. It is easy to make mistakes when configuring repeatedly with exposure elements
[0009] In addition, since the division of the display panel area is required even without cutting the layout data, it is necessary to specify the repeated arrangement of the exposure elements.
At this time, there are many cases where repeated configuration instruction errors occur

Method used

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  • Photo mask verification system and program
  • Photo mask verification system and program
  • Photo mask verification system and program

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Embodiment Construction

[0075] The mask verification system and the program for mask verification according to the embodiment of the present invention will be described below.

[0076] Furthermore, the mask verification system according to the embodiment of the present invention is constituted by one or more computers and a program for mask verification that configures the mask verification system by execution of the computers, which will be described in detail later. The said computer functions as a mask data creation system for creating mask data by executing the program for mask data creation. In addition, in each figure, the same code|symbol is attached|subjected to the same part.

[0077] figure 1 It is a figure which shows the relationship of the panel board|substrate for flat panel displays (FPD) in this embodiment, and a photomask, and figure (a) is a plan view, and figure (b) is a side view.

[0078] exist figure 1 Among them, 101 is the panel substrate, 102 is the exposure area of ​​the ...

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Abstract

The invention provides a photomask verification system and program capable of previously verifying the exposure result of the exposure factor provided on the photomask; wherein, the CPU (7) generates the panel layout factor on the display panel corresponding to the exposure factor according to the graphic data and coordinate information of the exposure factor stored in the data file storing portion (5) of the storing portion (8), and verifies whether the exposure factor is wrong by judging the postion relationship of the plurality of panel layout factors on the display panel; the display portion (1) displays the verifying result in the panel substrate window (9) or the photomask window (10).

Description

technical field [0001] The present invention relates to a reticle verification system for verifying whether or not reticle data has been produced in order to perform desired exposure, and more particularly to a reticle for verifying reticle data for flat panel display manufacturing Authentication system. Background technique [0002] The mask data for flat panel display (FPD) production defines a frame on the panel layout data, and is created as an exposure element (hereinafter also referred to as a repeating element) by clipping, and includes graphic data of the above-mentioned exposure element and an image indicating the exposure position on the panel substrate. coordinate information. [0003] When transferring to the FPD panel substrate using the mask data, the coordinate information of the arrangement exposure elements using the mask data is transferred to the FPD panel substrate in the exposure device. [0004] At this time, if there is an error in the pattern data o...

Claims

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Application Information

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IPC IPC(8): G03F7/20G03F1/14G02F1/13G03F1/68G03F1/70G03F1/84
CPCG03F1/84
Inventor 千田英树
Owner JEDAT