Microwave plasma source and plasma processing apparatus

A technology of microwave plasma and microwave plasma, which is applied in the direction of plasma, semiconductor/solid-state device manufacturing, gaseous chemical plating, etc., can solve problems such as complex devices, and achieve the effect of eliminating the influence of reflection
CN101385129AActive Publication Date: 2009-03-11TOKYO ELECTRON LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
TOKYO ELECTRON LTD
Publication Date
2009-03-11

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Abstract

A microwave plasma source (2) is provided with a microwave outputting section (30) which outputs microwaves in a plurally divided state, and a plurality of antenna modules (41) for guiding the plurally divided microwaves into a chamber. Each antenna module (41) is provided with an amplifier section (42) having an amplifier (47) for amplifying the microwaves, an antenna section (44) having an antenna (51) for radiating the amplified microwaves into the chamber, and a tuner (43) for adjusting impedance in a microwave transmission path. The tuner (43) is integrally arranged with the antenna section (44) to be close to the amplifier (47).
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Description

technical field

[0001] The present invention relates to a microwave plasma source and a plasma treatment device using the microwave plasma source. Background technique

[0002] In the manufacturing process of semiconductor devices and liquid crystal display devices, in order to perform plasma processing such as etching processing or film forming processing on substrates such as semiconductor wafers and glass substrates, plasma etching devices such as plasma etching devices or plasma CVD film forming devices are used. Processing device.

[0003] As a method of generating plasma in a plasma processing apparatus, there is known a method of supplying processing gas into a chamber in which parallel plate electrodes are arranged, supplying predetermined power to the parallel plate electrodes, and generating plasma by capacitive coupling between the electrodes. and a method in which electrons are accelerated by an electric field generated by microwaves and a magnetic field generat...

Claims

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