Alignment verification method for exposure machine
A verification method and exposure machine technology, which is applied to originals for photomechanical processing, microlithography exposure equipment, and photolithography exposure devices, etc., which can solve problems such as roughness, unmeasurable alignment accuracy, and inability to know alignment accuracy, etc. problem, to achieve quality assurance, to facilitate quality control, and to reduce the amount of plate washing
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[0045] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments. Such as Figure 1 to Figure 8 As shown, the alignment verification method of the exposure machine in this preferred embodiment includes the following steps:
[0046] (1) Design of film 1:
[0047] Such as figure 1 with figure 2 As shown, the four corners of the lower film 1 are respectively provided with an alignment circle arrangement structure 10, the above-mentioned alignment circle arrangement structure 10 includes a plurality of alignment circles 11, and the above-mentioned plurality of alignment circles 11 includes an alignment reference circle 12. The above-mentioned multiple alignment circles 11 are separated from each other, the radius of the above-mentioned multiple alignment circles 11 is the same, the centers of the circles are arranged in a straight line, and the center distances are equal; in order to improve the accuracy of the...
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Abstract
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