Alignment verification method for exposure machine
A verification method and technology of exposure machines, which are applied in the fields of photomechanical processing of originals, microlithography exposure equipment, photolithography process exposure devices, etc., can solve the problem of unmeasurable, rough, and inability to know alignment accuracy problems, to achieve the effect of being conducive to quality control, quality assurance, and reducing the amount of plate washing
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[0045] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments. Such as Figure 1 to Figure 8 As shown, the alignment verification method of the exposure machine in this preferred embodiment includes the following steps:
[0046] (1) Design of lower film 1:
[0047] Such as figure 1 and figure 2 As shown, the four corners of the lower film 1 are respectively provided with an alignment circle arrangement structure 10, the above-mentioned alignment circle arrangement structure 10 includes a plurality of alignment circles 11, and the above-mentioned plurality of alignment circles 11 includes an alignment reference circle 12. The above-mentioned multiple alignment circles 11 are separated from each other, the radius of the above-mentioned multiple alignment circles 11 is the same, the centers of the circles are arranged in a straight line, and the center distances are equal; in order to improve the accuracy o...
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