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Alignment verification method for exposure machine

A verification method and technology of exposure machines, which are applied in the fields of photomechanical processing of originals, microlithography exposure equipment, photolithography process exposure devices, etc., can solve the problem of unmeasurable, rough, and inability to know alignment accuracy problems, to achieve the effect of being conducive to quality control, quality assurance, and reducing the amount of plate washing

Inactive Publication Date: 2012-06-27
CHINA CIRCUIT TECH SHANTOU CORP +1
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the alignment verification of the exposure machine has to wait until the verification plate is etched, and then use the X-ray inspection machine to judge whether there is a misalignment through the concentricity of the original target. At the same time, the current alignment verification method of the exposure machine is very rough. Only two conclusions can be drawn: "misalignment" or "no misalignment". Therefore, in the current alignment verification method of the exposure machine, the alignment accuracy cannot be measured, so it is impossible to know what the alignment accuracy is

Method used

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  • Alignment verification method for exposure machine
  • Alignment verification method for exposure machine
  • Alignment verification method for exposure machine

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Embodiment Construction

[0045] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments. Such as Figure 1 to Figure 8 As shown, the alignment verification method of the exposure machine in this preferred embodiment includes the following steps:

[0046] (1) Design of lower film 1:

[0047] Such as figure 1 and figure 2 As shown, the four corners of the lower film 1 are respectively provided with an alignment circle arrangement structure 10, the above-mentioned alignment circle arrangement structure 10 includes a plurality of alignment circles 11, and the above-mentioned plurality of alignment circles 11 includes an alignment reference circle 12. The above-mentioned multiple alignment circles 11 are separated from each other, the radius of the above-mentioned multiple alignment circles 11 is the same, the centers of the circles are arranged in a straight line, and the center distances are equal; in order to improve the accuracy o...

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Abstract

The invention discloses an alignment verification method for an exposure machine. The method comprises the following steps of: (1) design of a lower film: forming a plurality of alignment circles which are externally separated from one another and have the same radius, wherein the centers of the alignment circles are arranged linearly at equal intervals; (2) design of an upper film: correspondingly forming a plurality of verification circles on the upper film by using a concentric circle method, wherein the radiuses of the verification circles sequentially increase; and (3) measurement: respectively arranging the upper film and the lower film on an upper table surface and a lower table surface of the exposure machine, when the upper film and the lower film are aligned, observing the coincidence degree of each verification circle and each alignment circle from small to large by taking a verification reference circle as a starting point, if each verification circle and the corresponding alignment circle are concentric, determining that an accuracy requirement is met, otherwise, observing all verification circles one by one by taking the verification reference circle as the starting point, wherein the difference of the radiuses of the verification circle and the alignment circle, which are internally tangent, is the alignment offset of the upper film and the lower film and the alignment offset of the exposure machine, so that the alignment accuracy of the exposure machine can be quantitatively measured.

Description

technical field [0001] The invention relates to an alignment verification method of an exposure machine. Background technique [0002] With the rapid development of electronic technology, electronic products are constantly developing in the direction of miniaturization and high reliability. Therefore, printed circuit boards used in electronic products are also developing in the direction of miniaturization and high density. Therefore, printed circuit boards The route on the board becomes finer, and the pads on the printed circuit board become denser. In this way, in the exposure process of the printed circuit board, the requirements for the alignment accuracy of the printed circuit board become more and more high. [0003] At present, the alignment verification of the exposure machine has to wait until the verification plate is etched, and then use the X-ray inspection machine to judge whether there is a misalignment through the concentricity of the original target. At the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F9/00G03F1/42
Inventor 贝俊涛陈晓璇陈建华李雪洽苏维辉杨晓新林蓄流林炳亮
Owner CHINA CIRCUIT TECH SHANTOU CORP
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