Liquid crystal element
A liquid crystal element and liquid crystal layer technology, applied in nonlinear optics, instruments, optics, etc., can solve problems such as increasing threshold voltage, unstable reverse twist orientation state, etc.
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Embodiment 1
[0047] The liquid crystal element of Example 1 was produced under the following conditions, and the characteristic was evaluated. First, two glass substrates with an ITO film were prepared, washed and dried. Then, an alignment material was applied to the surface of each glass substrate. As an alignment material, a horizontal alignment material that imparts a pretilt angle of 1 to 2 degrees to liquid crystal molecules is suitably used. The alignment material of one glass substrate was sintered and rubbed. Thereafter, a spacer material is spread on the glass substrate, and a sealing material is printed. A substance having a particle diameter of 4 μm was used as the spacer material. Also, the alignment material was sintered on another glass substrate, and a rubbing treatment was performed on it. Thereafter, the two glass substrates are bonded together to form a unit, and a liquid crystal material is injected into it. Regarding the bonding of two glass substrates, the directi...
Embodiment 2
[0050] A liquid crystal element was produced under the same conditions as in Example 1 above, and its characteristics were evaluated. Wherein the following conditions are different from Example 1. In this example, the value of d / p0 is 0.2 or 0.4, and the addition amount of the ultraviolet curable resin is 4 wt%, 5 wt%, 6 wt%, and 7 wt%. In addition, in this example, ultraviolet irradiation was performed using a mask having a grid-like (matrix-like) pattern. Figure 9 The structure of the mask used for ultraviolet irradiation in this example is shown.
[0051] As shown, the grid-like pattern of the mask has a line width of about 180 μm and a line pitch of 20 μm. In addition, the wavelength of ultraviolet rays is 365nm, and the irradiation intensity is 80mW / cm 2 . Mask exposure was performed with the exposure intensity repeated 4 times for 1 minute each, and finally the mask was removed and exposure was performed for 1 minute (full-surface irradiation). At this time, voltag...
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Abstract
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