Ultrastrong femtosecond laser pulse all-parameter in-situ measurement system and measurement method and application

A femtosecond laser and in-situ measurement technology, applied in the direction of instruments, etc., can solve the problems of small sensitivity and dynamic range, poor physical correlation and real-time performance, and large errors

Inactive Publication Date: 2013-09-04
PEKING UNIV
View PDF4 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The estimation method of the former has a large error (even reaching several times the real value), while the sensitivity and dynamic range of the latter measurement are very small (related to the ionization characteristics of the working medium)
In addition, the various parameters of the pulse used to calculate the measurement results are separately measured with different measurement m

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Ultrastrong femtosecond laser pulse all-parameter in-situ measurement system and measurement method and application
  • Ultrastrong femtosecond laser pulse all-parameter in-situ measurement system and measurement method and application
  • Ultrastrong femtosecond laser pulse all-parameter in-situ measurement system and measurement method and application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0048] The present invention will be further elaborated below through specific embodiments in conjunction with the accompanying drawings.

[0049] Such as figure 1 As shown, the ultra-strong femtosecond laser pulse full-parameter in-situ measurement system of this embodiment includes: picosecond or sub-picosecond laser pulse 1, beam splitter 2, separator 5, laser pulse compression unit 8, the first inert gas atom 4 and the second gas atom 11, the first and second converging mirrors 3 and 10, the first to third mirrors 6, 7 and 9, and a photoelectron spectrometer 12; wherein, the picosecond or sub-picosecond laser pulse 1 passes through The beam splitter 2 splits into two beams of laser light; one of them passes through the first converging mirror 3 and directly excites the first inert gas atom 4 emitted from the first gas nozzle A to generate forward-emitting high-order harmonic radiation, that is, X-rays; The X-ray and the laser pulse are filtered out by the separator, and t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an ultrastrong femtosecond laser pulse all-parameter in-situ measurement system and measurement method and application. Femtosecond laser pulses are measured through X-ray; all parameters of the femtosecond laser pulses can be derived through a photoelectron spectroscopy obtained through measurement, including strength, pulse time width, carrier-envelope phase and pulse shape; the measurement method is a physical method, and no hypothesis is needed; and the measurement method is an analytic method, and time resolution measurement, data fitting and iterative computations are not needed. The measurement method is an in-situ measurement method, no change is needed to be made for the state of the femosecond laser pulse to be measured, the measurement result can directly reflect the physical relevance among all the parameters, and the measurement result is real-time, rapid and high in precision. The range of laser strength can reach 4-5 orders of magnitudes, the relative precision of the method is 0.1 % better than the precision of the laser strength, and is 1 % better than other parameters, and the method can widely be applied to scientific experiments and engineering surveying.

Description

technical field [0001] The invention belongs to ultra-strong and ultra-fast optics, and in particular relates to an in-situ measurement system, measurement method and application of all parameters of ultra-strong femtosecond laser pulses. Background technique [0002] Various ultra-intense and ultra-short laser pulses have been widely used in scientific experiments and engineering technologies, such as high-order harmonic radiation, suprathreshold ionization, nonlinear laser-electron Compton scattering, and laser ion acceleration. For the measurement of laser frequency, there are relatively mature methods at present, but for the in-situ measurement of all parameters such as the intensity (ie, energy density), pulse width, carrier-envelope phase and pulse intensity time distribution of ultra-intense laser pulses, it has been is one of the scientific problems. When the laser pulse intensity is low, it can be measured with photosensitive diodes, photomultiplier tubes, various ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01J11/00
Inventor 葛愉成
Owner PEKING UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap