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State-Based Power and Frequency Regulation

A frequency adjustment and state technology, applied in the adjustment of resonant circuits, automatic frequency control, plasma, etc., can solve the problem of impedance matching impedance not changing fast enough

Active Publication Date: 2017-04-12
LAM RES CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in some cases the impedance matching is not fast enough to respond to changes in the impedance of the plasma

Method used

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  • State-Based Power and Frequency Regulation
  • State-Based Power and Frequency Regulation
  • State-Based Power and Frequency Regulation

Examples

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Embodiment Construction

[0034] Systems and methods for state-based regulation of power and frequency are described in the following embodiments. It will be apparent that the present embodiments may be practiced without some or all of these specific details. In other instances, well known process operations have not been described in detail in order not to unnecessarily obscure the embodiments of the invention.

[0035] figure 1 is a block diagram of an embodiment of a system 180 for reducing the amount of time needed to adjust a power controller and / or frequency tuner based on changes in the impedance of the plasma. A 2 megahertz (MHz) radio frequency (RF) power supply provides RF power to the lower electrode 104 of the plasma chamber 102 via an impedance matching circuit 182 . Likewise, a 60 MHz power supply supplies RF power to the bottom electrode 104 via the impedance matching circuit 186 . It should be noted that in one embodiment, instead of a 60 MHz source, a 27 MHz source is used to provid...

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Abstract

The present invention describes systems and methods for state-based power and frequency regulation. The main generator of the system includes a main power supply for providing a main radio frequency (RF) signal to the electrodes. The main generator further includes an automatic frequency control unit (AFC) to provide a first frequency input to the main power supply when the pulse signal is in the first state. The slave generator of the system includes a slave power supply for providing a slave RF signal to the electrodes. The slave generator also includes an AFC to provide a second frequency input to the slave power supply when the pulse signal is in the first state. The slave generator includes an AFC to provide a third frequency input to the slave power supply when the pulse signal is in the second state. The system includes a digital pulse source for generating a pulse signal.

Description

technical field [0001] Embodiments of the present invention relate to improving response time to changes in plasma impedance, and more particularly to apparatus, methods and computer programs for state-based power and frequency regulation. Background technique [0002] In some plasma processing systems, multiple radio frequency (RF) signals are provided to one or more electrodes in the plasma chamber. The RF signal helps generate plasma within the plasma chamber. The plasma is used for various operations such as cleaning the substrate on the lower electrode, etching the substrate, and the like. [0003] Between the RF supplier generating the RF signal and the plasma chamber, an impedance matching circuit is usually provided. An impedance matching circuit matches the impedance of a load (eg, a plasma within a plasma chamber) to the impedance of a source (eg, an RF power supply). However, in some cases the impedance matching is not fast enough to respond to changes in the i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H05H1/46
CPCH03J7/00H05H2242/26H01J37/32146H01J37/32183H05H1/4645H02J3/00H05H1/46
Inventor 约翰·C·小瓦尔考布拉德福德·J·林达克
Owner LAM RES CORP
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