Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A symmetrical edge embossing wheel pressing device

A pressing device, symmetrical technology, applied in the direction of machining/deformation, to achieve the effect of eliminating abnormal wear, prolonging service life and ensuring quality

Active Publication Date: 2016-06-29
上海东冠纸业有限公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The object of the present invention is to provide a symmetrical side embossing wheel depressing device which solves the problem that one side is deep and the other side is shallow in order to overcome the defects of the above-mentioned prior art, prolong the service life and reduce the cost.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A symmetrical edge embossing wheel pressing device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0019] A symmetrical side embossing wheel pressing device, its structure is as follows figure 1 As shown, the device includes a side embossing wheel shaft 1, a shaft retaining ring 2, a side embossing wheel 3, a depressing guide post 4, and a pin shaft 5.

[0020] Side embossing wheel shafts 1 are arranged on both sides of the lower part of the depressing guide post 4, and the side embossing wheel shafts 1 are connected to the pressing down guide posts through pin shafts 5, and side embossing wheels 3 are sheathed on the side embossing wheel shafts 1. , the warp shaft is fixed on the side embossing wheel shaft 1 with the spring retaining ring 2, so that the side embossing wheel 3 is symmetrically arranged on both sides of the depressing guide post 4, and evenly distributes the pressure generated when the depressing guide post 4 is pressed down.

[0021] Working principle: Install two side embossing wheels 3 face-to-face symmetrically on both ends of the side embossing wheel sh...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a symmetrical side embossing wheel depressing device, comprising a depressing guide column (4) and a side embossing wheel (3), two side embossing wheels (3) are arranged symmetrically on the depressing guide Both sides of the post (4) evenly distribute the pressure generated when the guide post (4) is pressed down. Compared with the prior art, the present invention solves the problem that one side of the embossing is deep and the other side is shallow, and it also has the advantages of prolonging the service life and reducing the use cost.

Description

technical field [0001] The invention relates to an embossing device, in particular to a symmetrical edge embossing wheel depressing device. Background technique [0002] In order to meet the requirements of consumers, the existing facial tissue processing machines mostly use edge embossing devices to ensure that the facial tissue products are not delaminated. However, the pressing device of the side embossing wheel of the facial tissue machine adopts an asymmetric structure design. During the production process, one side embossing is deep and the other side is shallow. The analysis reason is caused by the imbalance between the pressing force and the reaction force. The most important thing is the eccentric force. The side of the side embossing wheel under high pressure is easy to wear, and the side under small pressure is not easy to wear. Therefore, after a period of production, the embossing wheels on both sides wear differently, and the product quality cannot be guarantee...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B31F1/07
Inventor 杨子吴如岗
Owner 上海东冠纸业有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products