Adsorption Silicon Wafer Coating Rotary Table

An adsorption-type, rotary table technology is applied to devices and coatings that apply liquid to the surface, which can solve the problems of difficult silicon wafers, inconvenient coating, uneven coating, etc. Easy to put and take effect

Active Publication Date: 2017-06-23
永春县产品质量检验所福建省香产品质量检验中心国家燃香类产品质量监督检验中心福建
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, since there is no clamping device on the table of the adsorption equipment, and the diameter of the table is smaller than the diameter of the silicon wafer, it is difficult for the operator to place the silicon wafer at the concentric position with the table. If the silicon wafer deviates greatly from the center of the table, Not only is it inconvenient to coat, but also causes uneven coating

Method used

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  • Adsorption Silicon Wafer Coating Rotary Table
  • Adsorption Silicon Wafer Coating Rotary Table

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Experimental program
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Embodiment Construction

[0013] Such as figure 1 and figure 2 As shown, the specific embodiment of the present invention includes a table top 1, on which a circular platform 11 that is concentric with it and arranged radially in a stepped shape is provided. The height of 11 is the same as the height of the silicon wafer or slightly less than the height of the silicon wafer, so that when coating, the edge of the silicon wafer can also be evenly coated.

[0014] In order to facilitate the taking and placing of silicon wafers, an opening 12 extending toward the center of the circle is provided on the edge of the table 1. The opening 12 is in the shape of a semicircle. Preferably, the opening 12 includes two symmetrically arranged up and down and two symmetrically arranged left and right. In this way, the table top 1 is divided into four blades by the opening 12, which not only facilitates the taking and placing of silicon wafers, but also saves materials and reduces costs.

[0015] In order to generat...

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PUM

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Abstract

An absorption type wafer coating rotating table comprises a table board and is characterized in that radially arranged ring tables in a stepped shape are arranged on the table board and concentric with the table board, and openings extending toward the circle center are formed in the edge of the table board; a baffle plate as high as the ring table on the innermost side is arranged at the tail end of each opening, two ends of the baffle plate are connected with the ring table on the innermost side, and a gap is formed in the baffle plate. By means of the ring tables arranged on the table board, the problem that wafers are not concentric with the table board when an operator places the wafers is solved, and the openings formed in the edge of the table board facilitate taking of the wafers; and the rotating table is simple in structure, different diameters of wafers can be placed, the cost is lower than that of clamping type rotating equipment, and the rotating table is not prone to damage.

Description

technical field [0001] The invention relates to silicon chip coating equipment, in particular to an adsorption type silicon chip coating rotary table. Background technique [0002] At present, there are two main types of coating and rotating equipment in the silicon wafer processing and coating process. One is the clamping type, which is equipped with a clamping device to clamp the silicon wafer on the table; the other is the adsorption type, which It includes a table, a rotating shaft, a motor, a vacuum pump and a switch. The table is set on the top of the rotating shaft, and a through hole is arranged in the central axis of the rotating shaft. The suction end of the vacuum pump is connected to the central through hole of the rotating shaft. The motor is used to drive the rotating shaft to rotate. It is a circular plane, and the center of the table is provided with the same through hole as the through hole on the rotating shaft. When the adsorption equipment is in use, put...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B05C13/02
Inventor 袁国防
Owner 永春县产品质量检验所福建省香产品质量检验中心国家燃香类产品质量监督检验中心福建
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