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An Optimum Design Method of High Lift Device Considering the Motion Trajectory

A technology of increasing the lift device and motion trajectory, which is applied in the field of transport aircraft, and can solve the problems of increasing the size of the rectifying device of the motion mechanism, keeping it unchanged, and difficult to obtain a satisfactory take-off configuration.

Active Publication Date: 2016-08-24
CHINA ACAD OF AEROSPACE AERODYNAMICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Doing so will make it difficult to obtain satisfactory take-off configuration performance, and sometimes increase the complexity and size of the kinematic mechanism, which will not only bring about no change to the design of the kinematic mechanism, but also increase the size of the kinematic mechanism rectification device, resulting in unnecessary resistance loss

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  • An Optimum Design Method of High Lift Device Considering the Motion Trajectory
  • An Optimum Design Method of High Lift Device Considering the Motion Trajectory
  • An Optimum Design Method of High Lift Device Considering the Motion Trajectory

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Embodiment Construction

[0032] The present invention will be described in detail below with reference to the accompanying drawings.

[0033] The lift-enhancing device is composed of leading edge slats, main wings and trailing edge flaps, and is an important part of the wing. The trailing edge flaps can be divided into single-slotted flaps and multi-slotted flaps. In the process of take-off and landing, the slats and flaps of the wing are deflected forward and backward respectively under the drive of the motion mechanism, which provides sufficient aerodynamic force for the aircraft. In the process of aerodynamic design of the lift-enhancing device, the first step is to design the two-dimensional lift-enhancing device according to the two-dimensional airfoil profile of the wing.

[0034] The first step: carry out the aerodynamic shape design of the two-dimensional lift device on the basis of the two-dimensional airfoil;

[0035] The Bezier curve is used to design the surface shape of the lifting devi...

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Abstract

The invention discloses a high-lift device optimum design method taking a motion locus into account. The method comprises the concrete steps as follows: 1. conducting a two-dimensional high-lift device aerodynamic configuration design on the basis of a two-dimensional airfoil profile; 2. conducting a two-dimensional motion mechanism motion locus design; 3. obtaining the aerodynamic configuration in a take-off state, the aerodynamic configuration in a landing state and the slot parameters of the airfoil profile; 4. computing the two-dimensional aerodynamic force of a high-lift device; 5. optimizing the slot parameters of the high-lift device, repeating Step 2 to Step 4, and optimizing the geometrical parameters of a motion mechanism meeting take-off and landing aerodynamic performance requirements as well as the drift angle of the airfoil profile until the optimal results are obtained. According to the method, the slot parameters of the take-off configuration and the landing configuration are obtained by simulating the whole motion locus curve of the motion mechanism of the high-lift device, and the synchronous optimum design of the take-off configuration and the landing configuration of the high-lift device can be realized on the basis of ensuring locus realization.

Description

technical field [0001] The invention relates to an optimization design method for a lifting device, in particular to an optimization design method for a lifting device considering a motion trajectory, and belongs to the technical field of transporters. Background technique [0002] The performance of the lift-enhancing device is one of the important indicators to measure the design level of civil passenger aircraft, which is related to the safety, economy and environmental protection of the aircraft. The design of the lift device requires the required lift to be obtained in the simplest form possible, the take-off configuration requires as little resistance as possible to meet the requirements of the take-off field, and the landing configuration requires high lift and high resistance. [0003] The high-lift device needs to be deflected into the take-off and landing configuration under the drive of the kinematic mechanism. The takeoff configuration and the landing configurat...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B64F5/00
Inventor 郝璇苏诚张卫民
Owner CHINA ACAD OF AEROSPACE AERODYNAMICS