A Method of Finding the Cause of Infrared Cut-off Film Manufacturing Deviation by Grouping
A technology of infrared cut-off film and manufacturing deviation, applied in the field of optical filters, can solve the problems of relatively little control, prolonged period, and unfavorable quality improvement.
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[0016] The present invention will be described below in conjunction with specific embodiments.
[0017] A method for finding the cause of deviations in the manufacture of infrared cut-off films by means of subgroups, comprising the following process steps, specifically:
[0018] a. Use a spectrophotometer to actually measure the spectroscopic curve of the infrared cut-off filter, and obtain deviated spectroscopic curves and data;
[0019] b. Use the TFC film system design software to open the original design program corresponding to the actually measured infrared cut filter, save the original design curve and the parameters of each film layer, and delete the original target setting data;
[0020] c. Import the actually measured and deviated spectroscopic curve data into the target setting, and display the new target spectroscopic curve;
[0021] d. Use the grouping function of the TFC film system design software to group all the film layers of the infrared cut-off film accord...
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