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A method of reproducing scan lines on a glass substrate

A glass substrate, re-manufacturing technology, applied in nonlinear optics, patterned surface photoengraving process, semiconductor/solid-state device manufacturing, etc., can solve problems such as normal output, abnormal alignment and grasping, etc.

Active Publication Date: 2018-01-12
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This will cause the exposure machine to have abnormal alignment and capture in the subsequent production steps, so that it cannot produce normally

Method used

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  • A method of reproducing scan lines on a glass substrate
  • A method of reproducing scan lines on a glass substrate
  • A method of reproducing scan lines on a glass substrate

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Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] The present invention will be further described below in conjunction with accompanying drawing.

[0027] The original first metal layer is deposited on the glass substrate for the first time and the original first metal layer is patterned to form the original scanning line and the original alignment mark. This process is specifically:

[0028] Film forming stage: First, a layer of molybdenum film is formed on one surface of the glass substrate by physical vapor deposition (PVD). Then, a layer of copper film is formed on the molybdenum film by physical vapor deposition (PVD). The molybdenum film and the copper film are collectively referred to as the original first metal layer.

[0029] PR coating stage: coating photoresist on the original first metal layer to form a photoresist layer on the original first metal layer. The photoresist can be, for example, a positive photoresist. The positive photoresist can be dissolved by the developer after being irradiated with ult...

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PUM

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Abstract

The invention provides a method for fabricating a scanning line on a glass substrate again. The method comprises the following steps: (1) filling an alignment mark groove in the glass substrate with a light-tight material to form a substrate mark in the alignment mark groove; and (2) aligning a light-transmitting first alignment mark on a scanning line mark at the substrate mark correspondingly. The scanning line is fabricated again on the glass substrate by the method; and and no double image phenomenon is formed on the glass substrate. Therefore, the phenomenon that an exposure machine cannot grab a new alignment mark due to double images on the glass substrate is avoided.

Description

technical field [0001] The invention relates to liquid crystal display technology, in particular to a method for remaking scanning lines on a glass substrate. Background technique [0002] The array substrate is the core component of the liquid crystal display device. Chinese patent application CN104112710A discloses a manufacturing method of an array substrate, which mainly includes the following steps: depositing a first metal layer on a base substrate (i.e. a glass substrate), patterning the first metal layer to form scanning lines; depositing The first insulating layer, patterning the first insulating layer to form a silicon island for the TFT channel; depositing the semiconductor layer and the second metal layer, patterning the second metal layer to form a data line, and patterning the semiconductor layer processing to form a thin film field effect transistor; depositing a second insulating layer, patterning the second insulating layer to form a contact hole; depositin...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/77G02F1/1362G02F1/1333G03F9/00
CPCG02F1/1333G02F1/1362G02F1/136286H01L21/77
Inventor 高鹏
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD