Unlock instant, AI-driven research and patent intelligence for your innovation.

Mask

A mask and ontology technology, which is applied to cosmetics, preparations for skin care, cosmetic preparations, etc., can solve the problems of insufficient face fit and poor fit, etc.

Inactive Publication Date: 2016-05-11
赵红英
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the cloth face mask has the advantages of being easy to put on and take off, it also has a fatal shortcoming. Due to the wide variety of face shapes and the different sizes and widths, it is still difficult for existing masks to meet the needs of all face shapes, resulting in people Face fit is not enough
In particular, the fit on both sides of the nose is extremely poor. The nose belongs to the highest convex part of the face. After the rest of the mask is fitted to the face, the parts on both sides of the nose and the mask are often in a suspended state. Multi-directional adjustments may not necessarily fit perfectly

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] The following are specific embodiments of the present invention and in conjunction with the accompanying drawings, the technical solutions of the present invention are further described, but the present invention is not limited to these embodiments.

[0018] As the embodiment of facial mask of the present invention, as figure 1 As shown, it includes a main body 1, the upper part of the main body 1 is provided with two eye openings 2 arranged symmetrically with each other, and the lower part of the main body 1 is provided with a mouth opening 3 below the eye opening 2, and the eye opening 2 The mouth opening 3 is hollowed out, and the middle part of the body 1 is located between the eye opening 2 and the mouth opening 3. There is a "U"-shaped nose slit, and the "U"-shaped nose slit is formed by an arc The nose slit 4 is composed of two mutually symmetrical linear nose slits 5, the lower ends of the two linear nose slits 5 are connected with the two ends of the arc-shaped...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the technical field of cosmetics, and relates to a mask. The mask comprises a body, wherein two eye openings in mutually symmetrical arrangement are formed in the upper part of the body; a mouth opening is formed in the lower part of the body and under the eye openings; the eye openings and the mouth openings are in a hollow shape; a U-shaped nose seam is formed in the middle part of the body and between the eye openings and the mouth opening, and is formed by an arc-shaped nose seam and two mutually symmetrical linear nose seams; the lower ends of the two linear nose seams are connected with the two ends of the arc-shaped nose seam; a folding stretching section is formed between a position under each eye opening and the U-shaped nose seam; materials of the body in the folding stretching sections are laminated to form drapes. By aiming at the problems in the prior art, the invention provides the mask with the advantages that the use is more convenient; the attaching effect is better.

Description

technical field [0001] The invention belongs to the technical field of cosmetics and relates to a facial mask. Background technique [0002] The types of facial masks are divided into five types according to their texture, which can be divided into five types: face cloth mask, tear-off mask, blended cream mask, cream mask, and fresh fruit homemade mask. Among them, the face mask is the most widely used, and it is the easiest one to put on and take off among the five kinds of masks. Although the cloth face mask has the advantages of being easy to put on and take off, it also has a fatal shortcoming. Due to the wide variety of face shapes and the different sizes and widths, it is still difficult for existing masks to meet the needs of all face shapes, resulting in people The face fit is not enough. In particular, the fit on both sides of the nose is extremely poor. The nose belongs to the highest convex part of the face. After the rest of the mask is fitted to the face, the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/02A61Q19/00
CPCA61K8/0212A61Q19/00
Inventor 赵红英
Owner 赵红英