Facial mask applicable to sensitive skin and method of preparing same

A technology for sensitive skin and sensitive mask, applied in the field of daily chemicals, can solve the problems of affecting moisturizing effect, skin discomfort, itching, etc., achieve a good comprehensive effect, avoid skin sensitivity, and increase the effect of absorption

Inactive Publication Date: 2016-11-09
佛山市富馨科技实业有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Most of the masks currently on the market are mainly nourishing and moisturizing, and the effect is remarkable, but they are not suitable for everyone
People with sensitive skin often use facial masks to cause redness, itching and other adverse reactions, which not only affect the moisturizing effect, but also cause serious skin discomfort

Method used

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  • Facial mask applicable to sensitive skin and method of preparing same
  • Facial mask applicable to sensitive skin and method of preparing same
  • Facial mask applicable to sensitive skin and method of preparing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] The invention provides a preparation method of a facial mask suitable for sensitive skin, comprising the following steps:

[0021] A. Add the active components, collagen oligopeptides, sodium hyaluronate, parabens, and deionized water into the mixing tank with stirring in sequence (see Table 1 for the component ratios), and start stirring at room temperature. After it is completely dissolved, filter out the impurities to obtain the mask essence;

[0022] B. Put 30g of facial mask essence into the packaging bag containing facial mask paper, and seal it.

[0023] Table 1 Components and content of facial mask essence

[0024] components

Mass percentage

Active ingredient (purslane extract)

2.00

collagen oligopeptide

20.00

Sodium hyaluronate

15.00

Ethylparaben

0.30

pure water

margin

[0025] The facial mask paper is a non-woven fabric, and the non-woven fabric substrate is a blended fiber of tencel fiber ...

Embodiment 2

[0028] The invention provides a preparation method of a facial mask suitable for sensitive skin, comprising the following steps:

[0029] A. Add the active ingredients, collagen oligopeptides, sodium hyaluronate, parabens, and deionized water into the mixing tank with stirring in sequence (see Table 2 for the component ratios), and start stirring at room temperature. After it is completely dissolved, filter out the impurities to obtain the mask essence;

[0030] B. Put 30g of facial mask essence into the packaging bag containing facial mask paper, and seal it.

[0031] The facial mask paper is non-woven fabric, and the base material of the non-woven fabric is tencel fiber.

[0032] The said tencel fiber is a triangular section fiber.

[0033] Table 2 Components and content of facial mask essence

[0034] components

Mass percentage

Active ingredients (see Table 3)

15.00

collagen oligopeptide

40.00

Sodium hyaluronate

7.00

Para...

Embodiment 3

[0041] The invention provides a preparation method of a facial mask suitable for sensitive skin, comprising the following steps:

[0042] A. Add the active components, collagen oligopeptides, sodium hyaluronate, parabens, and deionized water into the mixing tank with stirring in sequence (see Table 5 for the component ratios), and start stirring at room temperature. After it is completely dissolved, filter out the impurities to obtain the mask essence;

[0043] B. Put 30g of facial mask essence into the packaging bag containing facial mask paper, and seal it.

[0044] The facial mask paper is non-woven fabric, and the base material of the non-woven fabric is tencel fiber.

[0045] The said tencel fiber is a triangular section fiber.

[0046] Table 5 Components and Contents of Mask Essence

[0047]

[0048]

[0049] Table 6 Active ingredient list

[0050] components

Mass percentage

Purslane Extract

50.00

tea extract

50.00 ...

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PUM

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Abstract

The present invention discloses a facial mask applicable to sensitive skin, mainly comprising: 2-15% of active ingredients such as portulaca extract, tea extract and Cortex Moutan extract, 20-40% of collagen oligopeptide, 2-15% of sodium hyaluronate, 0.01-0.8% of paraben ester, and the balance of purified water. By adding the active ingredients, the facial mask is given good applicability to sensitive skin; by using nonwoven cloth of deformed fiber base material, it is possible to provide better retention of moisturizing ingredients in the mask base material and better skin adsorption, and it is also possible to effectively improve retention of the active ingredients, giving good moisturization and comfort.

Description

technical field [0001] The invention belongs to the field of daily chemicals, and in particular relates to a mask suitable for consumers with sensitive skin and a preparation method thereof. Background technique [0002] Most of the facial masks currently on the market are mainly nourishing and moisturizing, and the effect is remarkable, but they are not suitable for everyone. People with sensitive skin often use facial masks to cause redness, itching and other adverse reactions, which not only affect the moisturizing effect, but also cause serious discomfort to the skin. [0003] The invention provides a facial mask suitable for consumers with sensitive skin and a preparation method thereof. On the one hand, special-shaped fiber non-woven fabric is used as a base material, which can absorb more nutrient solution and provide better skin texture; on the other hand, , Adding naturally extracted, non-toxic and harmless active components to the mask essence can effectively inhi...

Claims

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Application Information

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IPC IPC(8): A61K8/64A61K8/65A61K8/73A61K8/97A61K8/02A61Q19/00
CPCA61K8/97A61K8/0212A61K8/645A61K8/65A61K8/735A61K2800/5922A61K2800/72A61Q19/005
Inventor 陈健良刘海峰陈国良哈成勇
Owner 佛山市富馨科技实业有限公司
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