Display substrate exposure method
A technology of display substrate and exposure method, applied in optics, optomechanical equipment, originals for optomechanical processing, etc., can solve pattern mask misalignment, pattern mask alignment mark alignment, and increase display equipment spots and other problems to achieve the effect of reducing overlapping deviation and preventing spots
Active Publication Date: 2020-05-08
SAMSUNG DISPLAY CO LTD
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Problems solved by technology
[0004] However, when the display device is enlarged, since the size of the pattern mask is limited, it is difficult to expose the display substrate by the pattern mask at one time, and as a result, a method of sequentially aligning and exposing the pattern mask on the display substrate is used
[0005] However, since it is difficult to accurately align the alignment marks on the pattern mask on the alignment reference points provided on the display substrate, the pattern mask is actually aligned on the display substrate in a misaligned state.
When pattern masks are sequentially aligned on a display substrate, stitch lines in which misalignment overlaps each other during exposure are formed, and as a result, there is a problem that overlay deviation occurs on the display substrate, and increased Possibility of generating defects such as speckles of display devices
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[0033] The invention will be described more fully hereinafter with reference to the accompanying drawings, in which exemplary embodiments of the invention are shown. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.
[0034] Furthermore, in the exemplary embodiments, since the same reference numerals designate the same elements having the same configuration, the first exemplary embodiment is representatively described, and in the other exemplary embodiments, only the components different from the first exemplary embodiment will be described. Construction of an exemplary embodiment.
[0035] It should be noted that the figures are schematic and not drawn to scale. For clarity and convenience, relative sizes and proportions of parts in the drawings are shown exaggerated or reduced in size in the drawings, and any dimensions are merely illustrati...
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Provided is a display substrate exposure method, which sequentially exposes a display substrate having a plurality of regions through a pattern mask, the method comprising: a first exposure step, through a first exposure step based on a first A substrate alignment mark aligns the mask alignment mark formed in the pattern mask to expose the first region of the display substrate; the first alignment result calculation step calculates the first substrate alignment mark and the mask alignment mark the first alignment result; a second substrate alignment mark setting step of setting a second substrate alignment mark in the non-display area of the second region of the display substrate by reflecting the first alignment result; and a second exposure step by The second substrate alignment marks are aligned with the mask alignment marks to expose a second region of the display substrate.
Description
technical field [0001] The described technology generally relates to a display substrate exposure method, and more particularly, to a method of sequentially aligning and exposing a display substrate having a plurality of regions with a pattern mask of an exposure apparatus. Background technique [0002] Currently known flat panel displays include liquid crystal displays (LCDs), plasma display panels (PDPs), organic light emitting diode devices (OLED devices), field effect displays (FEDs), electrophoretic display devices, and the like. [0003] Flat panel displays are manufactured through semiconductor processes, various patterns are formed during processing, and an exposure device is used for pattern formation. The exposure device exposes the target according to the pattern formed in the pattern mask. [0004] However, when the display device is enlarged, since the size of the pattern mask is limited, it is difficult to expose the display substrate by the pattern mask at on...
Claims
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IPC IPC(8): G03F7/22G03F1/42
CPCG03F1/42G03F7/22
Inventor 孙柱镐
Owner SAMSUNG DISPLAY CO LTD