Top-emitting device and manufacturing method thereof
A technology for top-emitting devices and devices, applied in the field of top-emitting devices and their preparation
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0028] In order to prepare the outcoupling layer 190 with a double-layer structure, the present invention adopts the method of inkjet printing. Specifically, the preparation method of the top-emitting device 100 in an embodiment includes:
[0029] S1: coating an anode layer 120 on the substrate 110 .
[0030] In this embodiment, Ag and ITO are sequentially coated on the glass substrate 110 to form a laminated double-layer film of Ag and ITO, and the glass substrate 110 coated with Ag and ITO is ultrasonically treated in a cleaning agent such as alcohol , and rinse with deionized water to preliminarily complete the cleaning of the glass substrate 110 . Then, the pre-cleaned glass substrate 110 is placed in a mixed solution of acetone and ethanol for ultrasonic treatment to remove oil on the glass substrate 110 . Place the cleaned glass substrate 110 in a clean environment to dry, then use ultraviolet light and ozone to clean, and bombard the surface of the glass substrate 110 ...
Embodiment 1
[0046] Coating Ag and ITO on the glass substrate 110 to form a laminated double-layer film of Ag and ITO, the glass substrate 110 coated with Ag and ITO is ultrasonically treated in a cleaning agent, such as alcohol, and is carried out with deionized water. Rinse, preliminarily complete the cleaning of the glass substrate 110, then place the preliminary cleaned glass substrate 110 in a mixed solution of acetone and ethanol for ultrasonic treatment to remove the oil on the glass substrate 110, and clean the glass substrate 110 after cleaning 110 is placed in a clean environment for drying, and then cleaned with ultraviolet light and ozone, and bombarded with a low-energy positive ion beam on the surface of the glass substrate 110 coated with Ag / ITO, so that an anode layer 120 is formed on the surface of the glass substrate 110 ;
[0047] The vacuum chamber was evacuated to 1×10 -5 Pa, and vacuum-deposited 4,4′,4″-tris(N-3-methylphenyl-N-phenylamino)triphenylamine (m-MTDATA) on...
Embodiment 2
[0056] Coating Ag and ITO on the glass substrate 110 to form a laminated double-layer film of Ag and ITO, the glass substrate 110 coated with Ag and ITO is ultrasonically treated in a cleaning agent, such as alcohol, and is carried out with deionized water. Rinse, preliminarily complete the cleaning of the glass substrate 110, then place the preliminary cleaned glass substrate 110 in a mixed solution of acetone and ethanol for ultrasonic treatment to remove the oil on the glass substrate 110, and clean the glass substrate 110 after cleaning 110 is placed in a clean environment for drying, and then cleaned with ultraviolet light and ozone, and bombarded with a low-energy positive ion beam on the surface of the glass substrate 110 coated with Ag / ITO, so that an anode layer 120 is formed on the surface of the glass substrate 110 ;
[0057] The vacuum chamber was evacuated to 1×10 -5 Pa, and vacuum-deposited 4,4′,4″-tris(N-3-methylphenyl-N-phenylamino)triphenylamine (m-MTDATA) on...
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 

