Six-degree-of-freedom locating regulating device for optical element, projecting objective lens and photoetching machine

Abstract

The invention provides a six-degree-of-freedom locating regulating device for an optical element. The six-degree-of-freedom locating regulating device comprises a lens cone, three groups of regulating branched chains for performing double-degree-freedom regulation and a supporting mirror frame for supporting the optical element, wherein the lower surface of the supporting mirror frame is separately connected with the output ends on the upper parts of the regulating branched chains, the mounting surfaces on the lower ends of the regulating branched chains are fixedly connected with the upper surface of the len cone ; under driving of each regulating branched chain, the mirror frame can generate two-degree-of-freedom displacement, and drives the optical elements to realize six-degree-of-freedom precise displacement regulation; by controlling feeding amount of six drivers, regulation on six-degree-of-freedom movement and rotation of the optical element is realized; and the six-degree-of-freedom locating regulating device has real-time displacement regulating ability, and can meet six-degree-of-freedom displacement precise regulation needs when the photoetching objective lens is debugged and maintained. The invention further provides a projecting objective lens provided with the six-degree-of-freedom locating regulating device and a photoetching machine.

Description

technical field [0001] The invention relates to the technical field of lithography projection objective lens, in particular to a six-degree-of-freedom nano-positioning adjustment device for an optical element, a projection objective lens and a lithography machine. Background technique [0002] With the continuous reduction of the characteristic line width of integrated circuits, the precision requirements of lithography objective lenses required for the manufacture of very large scale integrated circuits are getting higher and higher. The precision requirements of the multi-degree-of-freedom adjustment mechanism of the optical element used to compensate the magnification, astigmatism, distortion, field curvature and spherical aberration of the optical system in the lithography objective lens are also getting higher and higher. [0003] The adjustment amount of the mechanism is generally at the micron level, and its positioning accuracy often needs to reach the nanometer leve...

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Problems solved by technology

Traditional adjustment mechanisms such as rack and pinion, screw nuts, cams, and wo...

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