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Substrate liquid processing device, substrate liquid processing method, and storage medium

A liquid and liquid treatment technology, which is applied in the manufacture of electrical components, circuits, semiconductors/solid-state devices, etc., can solve problems such as difficulty in ensuring etching uniformity, and achieve the effect of etching uniformity

Active Publication Date: 2022-01-11
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, it is difficult to ensure etching uniformity only in this way, and improvement in etching uniformity is required

Method used

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  • Substrate liquid processing device, substrate liquid processing method, and storage medium
  • Substrate liquid processing device, substrate liquid processing method, and storage medium
  • Substrate liquid processing device, substrate liquid processing method, and storage medium

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Embodiment Construction

[0021] Below, refer to Figure 1 to Figure 4 Embodiments of the present invention will be described. First, the whole substrate liquid processing system 1A incorporating the substrate liquid processing apparatus 1 according to the present invention will be described.

[0022] Such as figure 1 As shown, the substrate liquid processing system 1A has a carrier input and output unit 2 , a substrate group formation unit 3 , a substrate group placement unit 4 , a substrate group transport unit 5 , a substrate group processing unit 6 and a control unit 7 .

[0023] Among them, the carrier input / output unit 2 is used to input and output the carrier 9 that accommodates a plurality of (for example, 25) substrates (silicon wafers) 8 arranged vertically in a horizontal posture.

[0024] The carrier input / output unit 2 is provided with a carrier table 10 for placing a plurality of carriers 9 , a carrier transport mechanism 11 for transporting the carriers 9 , and a carrier storage unit ...

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Abstract

The invention provides a substrate liquid processing device, a substrate liquid processing method and a storage medium. The boiling state of the phosphoric acid aqueous solution is kept constant without changing the concentration of the phosphoric acid aqueous solution, thereby realizing etching uniformity. A substrate liquid processing device (1) has a liquid processing unit (39), a processing liquid circulation line (42), and a boiling state detection unit (70) for adjusting a processing tank (34) provided in the liquid processing unit (39). The control unit (7) controls the supply pump (51) of the treatment liquid circulation line (42) based on the signal from the boiling state detection unit (70) to adjust the pressure of the phosphoric acid aqueous solution in the supply flow path, thereby reducing the phosphoric acid The boiling state of the aqueous solution is adjusted to a desired state.

Description

technical field [0001] The invention relates to a substrate liquid processing device, a substrate liquid processing method and a storage medium for liquid processing a substrate with a processing liquid. Background technique [0002] In the manufacture of semiconductor components, flat panel displays, etc., substrates such as semiconductor wafers and liquid crystal substrates are subjected to etching and other processing using processing liquids such as etching liquids using substrate liquid processing equipment. [0003] For example, in the substrate liquid processing apparatus disclosed in Patent Document 1, the substrate is immersed in a processing liquid (etching liquid: phosphoric acid aqueous solution) stored in a processing tank to remove silicon nitride formed on the surface of the substrate. The film is etched. [0004] In this substrate liquid processing apparatus, an aqueous phosphoric acid solution obtained by diluting phosphoric acid to a predetermined concentr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67H01L21/306
CPCH01L21/30604H01L21/67086H01L21/67253H01L21/67017H01L21/67248H01L21/67075H01L21/6715H01L21/67098
Inventor 田中裕司平山司稻田尊士
Owner TOKYO ELECTRON LTD