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System, method and computer program product for fast and automatic determination of signals for efficient metrology

A measurement method and signal technology, applied in the direction of measurement devices, optical devices, instruments, etc., can solve the problems of increased error of measurement parameters and failure to obtain

Active Publication Date: 2022-04-12
KLA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, by reducing the number of measurements from the full spectrum, the error in the measured parameters may increase
Also, many of these measurements may not actually be very informative

Method used

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  • System, method and computer program product for fast and automatic determination of signals for efficient metrology
  • System, method and computer program product for fast and automatic determination of signals for efficient metrology
  • System, method and computer program product for fast and automatic determination of signals for efficient metrology

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Embodiment Construction

[0016] In the field of semiconductor metrology, a metrology tool may include: an illumination system that illuminates a target; a collection system that captures relevant information provided by the interaction (or lack thereof) of the illumination system with the target, device, or feature; and A processing system that analyzes the collected information using one or more algorithms. Metrology tools can be used to measure structural and material properties (eg, material composition; dimensional properties of structures and films, such as film thickness and / or critical dimensions of structures; stacking, etc.) associated with various semiconductor manufacturing processes. These measurements are used to facilitate process control and / or yield efficiency in the fabrication of semiconductor die.

[0017] A metrology tool may include one or more hardware configurations that may be used in conjunction with certain embodiments of the present invention, for example, to measure the var...

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Abstract

The present invention provides a system, method and computer program product for selecting a signal to be measured with a metrology tool that optimizes the accuracy of the measurement. The technique includes the step of simulating a signal set for measuring one or more parameters of a metrology target. generating a normalized Jacobian matrix corresponding to the set of signals, selecting a subset of signals in the set of analog signals based on the normalized Jacobian matrix, the subset of signals optimizing the A performance metric is associated with one or more parameters, and a metrology tool is utilized to collect measurements for each signal in the subset of signals of the metrology target. For a given number of signals collected by the metrology tool, this technique optimizes the accuracy of such measurements compared to conventional techniques of collecting signals evenly distributed across a range of process parameters.

Description

[0001] Related applications [0002] This application claims the benefit of US Provisional Patent Application No. 61 / 264,482, filed December 8, 2015, which is hereby incorporated by reference in its entirety. technical field [0003] The present invention relates to metrology tools, and more particularly, the invention relates to configurations of metrology tools. Background technique [0004] Metrology generally involves measuring various physical characteristics of target components. For example, metrology tools may be used to measure structural and material properties (eg, material composition, dimensional properties of structures and / or critical dimensions of structures, etc.) of target components. In the example of semiconductor metrology, metrology tools may be used to measure various physical characteristics of manufactured semiconductor components. [0005] Once metrological measurements are obtained, the measurements can be analyzed. This analysis typically invo...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/21G01N21/01
CPCG01B11/0641G01N21/211G01B2210/56G01N2021/213G01N21/01G01N2021/0137G01B11/02
Inventor A·吉里纽A·库兹涅佐夫J·亨奇
Owner KLA CORP