A high-frequency shape compensation method of white light scanning interferometry

A technology of white light scanning and interferometry, applied in the field of white light scanning interferometry, can solve problems such as multiple reflections, limiting the measurement accuracy and accuracy of white light interferometers, and lateral resolution errors, so as to improve precision and accuracy, and the compensation method is simple Effective, the effect of improving measurement precision and accuracy

Active Publication Date: 2020-12-11
DALIAN UNIV OF TECH
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Problems solved by technology

However, due to the existence of various measurement errors, such as the lateral resolution error caused by the Rayleigh diffraction limit, multiple reflections, lateral chromatic aberration, etc., the measurement precision and accuracy of the white light interferometer are limited.

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  • A high-frequency shape compensation method of white light scanning interferometry
  • A high-frequency shape compensation method of white light scanning interferometry
  • A high-frequency shape compensation method of white light scanning interferometry

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Embodiment 1

[0045]The New view 5022 3D surface profiler from the US ZYGO company and the XE-200 AFM atomic force microscope from the Korean Park Systems company were used to measure the sample morphology. figure 2 and image 3 As shown, using MATLAB software to calculate the power spectral density curve of the topography measurement results of the above-mentioned measurement samples, the analysis found that the power spectral density of the ZYGO topography measurement results coincided with the power spectral density of the AFM measurement results in the low frequency region, while in the high frequency region In the area, there is an obvious downward trend, which is far lower than the power spectral density of the AFM measurement results. This is due to the resolution limitation of the ZYGO instrument, which leads to the power loss of the high-frequency area measurement results, which is lower than the actual power, resulting in invalid PSD high-frequency area data. It is lower than the...

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Abstract

The invention provides a high-frequency morphological compensation method based on white light scanning interferometry. The method comprises: S1, acquiring a high-low-frequency boundary point 1 / (Kdelta) according to a lateral resolution delta of a white light scanning interferometer; S2, calculating a power spectral density curve and high-frequency and low-frequency fitting straight lines of a morphological measuring result of the white light scanning interferometer; S3, extending the low-frequency fitting straight line to the high-frequency area, calculating a difference of longitudinal coordinates between a point on the extended line of the low-frequency fitting straight line in the high-frequency area and a point of a corresponding same horizontal point at the high-frequency fitting straight line as a correction value, and adding a data point in the high-frequency area on the power spectral density curve to the corresponding correction value to obtain a power spectral density curve after high-frequency area compensation; and S4, carrying out inversion on the compensated power spectral density curve to obtain a compensated morphology. Therefore, a problem that the measurement accuracy and accuracy are limited by influences of various measuring errors on the white light scanning interferometry surface contourgraph is solved.

Description

technical field [0001] The invention relates to the field of white light scanning interferometry, in particular to a high-frequency shape compensation method of white light scanning interferometry. Background technique [0002] The white light scanning interference surface profiler has fast measurement speed and high precision. It belongs to optical non-contact measurement, so it will not damage the surface to be measured. The measurement range can be from tens of microns to several millimeters, and the shape measurement accuracy can reach nanometer or even sub-nanometer level. , widely used in surface topography and roughness measurement of various precision samples. However, due to the existence of various measurement errors, such as the lateral resolution error caused by the Rayleigh diffraction limit, multiple reflections, lateral chromatic aberration, etc., the measurement precision and accuracy of the white light interferometer are limited. [0003] According to the R...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/24G01B11/30
CPCG01B11/24G01B11/30
Inventor 闫英赵林杰周平李萍郭东明
Owner DALIAN UNIV OF TECH
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