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Photoetching equipment and control method thereof

A control method and photo-etching technology, which are applied in the photo-engraving process of the pattern surface, the original for photo-mechanical processing, optics, etc. Effect

Pending Publication Date: 2019-09-20
BEIHAI HKC OPTOELECTRONICS TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

During the production process, the products that need to be processed by the yellow light machine are switched frequently, which causes the yellow light machine to stop running frequently and issue warnings, so that continuous production cannot be carried out, which has the disadvantage of declining production efficiency.

Method used

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  • Photoetching equipment and control method thereof
  • Photoetching equipment and control method thereof
  • Photoetching equipment and control method thereof

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Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0039] It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0040] The main solution of the embodiment of the present invention is:

[0041] Obtaining the material information of the material to be processed and the first mask number of the processing mask on the photoetching equipment, the material information including the second mask number and processing parameters of the processing mask corresponding to the material to be processed;

[0042] When the first photomask number is different from the second photomask number, replacing the processing photomask on the photoetching equipment with the processing photomask corresponding to the material to be processed;

[0043] controlling the photoetching equipment to process the material to be processed according to the processing parameters.

[0044] A method for controlling photoetching equipment and photoetching equipment prop...

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PUM

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Abstract

The invention discloses a control method of photoetching equipment. The control method comprises the following steps of obtaining material information of a to-be-processed material and a first photomask number of a processing photomask on the photoetching equipment, wherein the material information comprises a second photomask number of a processing photomask corresponding to the to-be-processed material, and a processing parameter; replacing the processing photomask on the photoetching equipment into the processing photomask corresponding to the to-be-processed material when the first photomask number and the second photomask number are different; and controlling the photoetching equipment to process the to-be-processed material according to the processing parameter. The invention further discloses the photoetching equipment. An effect of improving the production efficiency of the photoetching equipment is achieved.

Description

technical field [0001] The invention relates to the field of display panels, in particular to a method for controlling photoetching equipment and photoetching equipment. Background technique [0002] The production process of TFT-LCD includes a yellow light process, which requires placing a photomask between the glass film and the light source to etch specific patterns on the glass film through the light shielding effect of the photomask. Therefore, when the mask is selected incorrectly, the product currently being produced will be scrapped. [0003] At present, in order to avoid product scrapping due to wrong mask selection, a detection device is generally installed on the yellow light machine, which can detect the model of the currently installed mask, and then compare whether the detected model is the same as the predetermined model. , the yellow light machine will stop working and issue a warning. During the production process, the products that need to be processed by...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/80
CPCG03F1/80
Inventor 潘柏松
Owner BEIHAI HKC OPTOELECTRONICS TECH CO LTD