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Infrared glass and its preparation method

A technology of infrared glass and photoresist layer, which is applied in the direction of instruments, optics, optical filters, etc., can solve the problems of affecting the process, large warpage of infrared glass sheets, high cost of magnetron sputtering coating, etc., to achieve improved thickness consistency , Improve process flexibility, reduce the effect of a coating process

Active Publication Date: 2022-04-05
HOWE OPTOELECTRONICS TECH SHANGHAI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The cost of magnetron sputtering coating is high, and a special process is required to make various graphics and alignment graphics
The infrared glass sheet formed by double-sided (front and back) coating on the substrate has a large warpage, which affects the subsequent process

Method used

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  • Infrared glass and its preparation method
  • Infrared glass and its preparation method
  • Infrared glass and its preparation method

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Embodiment Construction

[0037] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. The advantages and features of the present invention will become more apparent from the following description. It should be noted that the accompanying drawings are in a very simplified form and use inaccurate scales, and are only used to facilitate and clearly assist the purpose of explaining the embodiments of the present invention.

[0038] An embodiment of the present invention provides an infrared glass, comprising:

[0039] a substrate having opposing first and second surfaces;

[0040] A filter photoresist layer is formed on the first surface,

[0041] A coating layer is formed on the second surface.

[0042] Specifically, as figure 1 and figure 2 As shown, the substrate 10 has opposing first and second surfaces 10a and 10b. The substrate may be a glass substrate or an optical-grade light-transmitting substrate. The substra...

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Abstract

The invention provides an infrared glass and a preparation method thereof. The infrared glass comprises: a substrate having opposite first and second surfaces; a filter photoresist layer is formed on the first surface; A coating layer is formed on the second surface. One side of the substrate of the present invention is formed with an evaporation process to form a coating layer, and the other side is coated with photoresist to form a filter photoresist layer to obtain the required filter band. Since the stress of the filter photoresist layer is very small, the warping deformation will be reduced, reducing the warpage of the infrared glass and improving the thickness consistency; the infrared glass can be adapted to more subsequent processes. Moreover, the filter photoresist layer is formed through a photolithography process, so that the desired pattern can be easily obtained, which improves the process flexibility. The cost is reduced, and one coating process is reduced.

Description

technical field [0001] The invention relates to the field of glass processing, in particular to an infrared glass and a preparation method thereof. Background technique [0002] Infrared glass refers to optical glass that can transmit electromagnetic radiation in the infrared band. It can be widely used in infrared detection and infrared imaging technology as windows and lenses. Infrared glass not only has good infrared transmission performance, excellent optical uniformity, high mechanical strength, but also has low manufacturing cost, simple optical processing technology, and can be processed into complex special-shaped products. [0003] The traditional infrared transmission (IRPF) filter glass is obtained by depositing filter films on the front and back sides of the substrate using magnetron sputtering (PVD). The cost of magnetron sputtering coating is high, and a special process is required to produce various patterns and alignment patterns. The infrared glass sheet f...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/00C03C17/32C03C17/34G02B5/20
CPCC03C17/3417C03C17/009C03C17/32C03C17/326G02B5/208G02B5/20
Inventor 庄迪斯陈一诚
Owner HOWE OPTOELECTRONICS TECH SHANGHAI
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