All-thin-film silicon semiconductor double-electrode bias-voltage-free photoelectrocatalysis full-water-decomposition hydrogen production system and application thereof
A photoelectric catalysis and thin-film silicon technology, which is applied in the direction of electrodes, electrolytic processes, electrolytic components, etc., to achieve the effect of slowing down the speed of corrosion
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[0026] Such as figure 1 A full-thin-film silicon semiconductor double-electrode unbiased photocatalytic hydrogen production system is shown, which includes Co 3 o 4 / nip photoanode, Pt / pin photocathode, electrolyte, light source 6, electrolytic cell 7, the structure of the photoanode is FTO substrate layer 1, single-section silicon film 2 of n / i / p structure, Co 3 o 4 Oxide film 3, the structure of the photocathode is FTO substrate layer 1, single-section silicon film 5 with p / i / n structure, hydrogen-producing metal Pt nanoparticle film 4, and the electrolyte is 1M KOH solution ; said Co 3 o 4 The preparation method of / nip photoanode is as follows: FTO (transparent conductive glass) substrate 1 is washed with acetone, ethanol, and water for 30 minutes each, then dried, and placed in a very high frequency plasma vapor deposition equipment (PEVCVD) to deposit and deposit n-type sequentially. Silicon thin film, intrinsic silicon thin film and p-type silicon thin film, obtain...
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