Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

An intelligent attendance management system based on face recognition

An intelligent management system, face recognition technology, applied in the direction of character and pattern recognition, data processing applications, instruments, etc., can solve the problems that the camera angle cannot be adjusted intelligently, and the attendance data cannot be processed intelligently, so as to achieve a high level of humanization and satisfy Attendance requirements, highly operable effects

Active Publication Date: 2021-03-30
福建平潭瑞谦智能科技有限公司
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The purpose of the present invention is to propose a smart attendance management system based on face recognition, which solves the problems that the attendance data cannot be intelligently processed and the camera angle cannot be intelligently adjusted in the existing attendance management system

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • An intelligent attendance management system based on face recognition
  • An intelligent attendance management system based on face recognition
  • An intelligent attendance management system based on face recognition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0042] see Figure 1-4 As shown, an intelligent attendance management system based on face recognition includes a face alignment adjustment subsystem, a parameter database, a face recognition subsystem and an attendance data processing subsystem, and the face alignment adjustment subsystem is used for Sensing the person to be checked and detecting the height of the person to be checked to adjust the angle of the camera according to the height so that the adjus...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an intelligent attendance management system based on face recognition, which includes a face alignment adjustment subsystem, a parameter database, a face recognition subsystem and an attendance data processing subsystem. The present invention uses the face alignment adjustment subsystem according to The height of the personnel waiting for attendance is adjusted to the camera angle to ensure that the adjusted camera can be directly aimed at the face of the personnel waiting for attendance, and the attendance status of the attendance check-in personnel is recorded through the attendance data processing subsystem, and the statistics of monthly attendance are late, The personnel who leave early or absent from work and the number of late arrivals, early departures or absences of each personnel in each month are sent to each personnel respectively, and at the same time, the deduction amount of the corresponding personnel is calculated according to the corresponding attendance deduction principle, which solves the current problem mentioned in the background technology In the attendance management system, the attendance data cannot be intelligently processed and the camera angle cannot be adjusted intelligently, which meets the attendance needs of modern personnel personnel.

Description

technical field [0001] The invention belongs to the technical field of attendance management, in particular to an intelligent attendance management system based on face recognition. Background technique [0002] Attendance management is the most basic work of enterprise labor discipline management and a part of performance management. Now most enterprises have used attendance management system. Through face recognition attendance management system, employees can clock in and go to get off work. Personnel personnel can conduct monthly attendance statistics based on the check-in status of each employee in the attendance management system, and then perform salary accounting. [0003] However, the current attendance management system has the following disadvantages: [0004] 1. The degree of intelligence is low, and the function is single. It can only display the check-in data of each employee in the enterprise, and cannot intelligently process and filter the data. The personnel...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G06K9/00G06F17/10G06Q10/10
CPCG06F17/10G06Q10/1091G06V40/166G06V40/168
Inventor 郭含新杨小毛
Owner 福建平潭瑞谦智能科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com