Micro-movement table and motion device

Abstract

The invention discloses a micro-movement stage, comprising: a stage; a rotating base, located below the stage; a rotating drive device, including a drive device mover and a drive device stator, the drive device stator is fixed relative to the rotation base, and the drive device mover fixed relative to the stage; the first vertical movement device is configured to drive the rotating base to move vertically; the micro-movement base is vertically slidably connected to the micro-motion base relative to the micro-motion base; the flexible connecting member includes an elastic piece, The elastic piece extends horizontally and radially, and the radially outer end of the elastic piece is connected to the micro-movement base, and the radially inner end of the elastic piece is connected to the rotating base; and the floating force compensation device is located under the rotating base and is configured to be able to Perform force compensation. The micro-motion table provided by the present invention can realize the precise positioning of the carried object in the Rx / Ry direction, and solve the problems of asynchronous drive on both sides of the planar motion device, motion stagnation caused by thermal deformation, and shortened life of the guide device.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, and in particular to a micro-motion stage and a motion device including the micro-motion stage. Background technique [0002] In the field of semiconductor silicon wafer manufacturing or testing, it is required that the workpiece table can complete the transfer of silicon wafers with the silicon wafer transmission system, and at the same time, it needs to carry the silicon wafers to complete the precise positioning of the silicon wafers, and finally complete the manufacturing or testing of the silicon wafers. Therefore, in the workpiece table device for application manufacturing or testing, the micro-motion table is its core component, and completes the precise positioning of the silicon wafer in the vertical and rotational axes. [0003] For example, U.S. Patent No. 6,779,278 B1 proposes a rotary micro-motion table solution in this field. The turntable of this invention...

AI Technical Summary

Problems solved by technology

This invention can realize the adjustment of three degrees of freedom in the vertical direction Rx, Ry and Rz, so that the vertical direction can be accurately positioned, but the combination of the reed and the spring will increase the load on the motor, resulting in a large amount of heat generated by the motor, which is harmful to the product. The improvement of rate and positioning accuracy is unfavorable

And only this mechanism can only realize vertical small stroke movement, and cannot realize the handover function of the silicon wafer and the transmission system

Moreover, this mechanism cannot realize the 360° rotation of the rotary table, and the reeds in this mechanism are stacked under the rotary table. When the rotary table performs Rx, Ry degrees of freedom adjustment, shock and vibration will be generated due to the movement of the upper rotary table

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