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A temperature-resistant porphyrin-grafted silica toner and its preparation method and application

A technology of silicon dioxide and porphyrin, which is applied in the field of anti-counterfeiting, can solve the problems of unsustainable temperature resistance of toner, unsatisfactory temperature resistance of toner, loss of holographic pattern, etc., and achieves excellent temperature resistance and simple preparation method High efficiency and low production cost

Active Publication Date: 2021-12-17
湖北宜美特全息科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the temperature resistance of toner in holographic recording materials is not durable, and chemical oxidation, carbonization and other deterioration phenomena will occur during long-term baking, resulting in adverse consequences such as loss of light and discoloration of holographic patterns
Therefore, the industry is eager to effectively solve the problem of the unsatisfactory temperature resistance of the toner

Method used

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  • A temperature-resistant porphyrin-grafted silica toner and its preparation method and application
  • A temperature-resistant porphyrin-grafted silica toner and its preparation method and application
  • A temperature-resistant porphyrin-grafted silica toner and its preparation method and application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Modification of carboxyl group and (3-aminopropyl) triethoxysilane group on porphyrin dye to obtain temperature-resistant porphyrin; the structure is shown in (II) below.

[0030] Synthesis of the heat-resistant porphyrin grafted silica toner of formula (II):

[0031]

[0032] Mix n-heptane, n-heptanol and surfactant Triton X-100 uniformly in a certain proportion, add an appropriate amount of water as a dispersed phase, then add a certain amount of heat-resistant porphyrin (II), stir for 5 minutes, and form Water-in-oil microcapsules, and then ethyl orthosilicate is added to the microcapsule system, after stirring evenly, an appropriate amount of lye is added for hydrolysis, and the entire reaction time is 8 hours. In the reaction system, the ratio of the amount of n-heptanol, n-heptane, surfactant triton X-100, water, temperature-resistant porphyrin, tetraethyl orthosilicate, and lye is 1:4:0.5:2.5: 0.1:1:1.1. After the reaction is completed, centrifuge and dry to...

Embodiment 2

[0035] The synthesis of the heat-resistant porphyrin grafted silica toner of formula (III) structure:

[0036]

[0037] Mix n-heptane, n-heptanol and surfactant Triton X-100 uniformly in a certain proportion, add an appropriate amount of water as a dispersed phase, then add a certain amount of heat-resistant porphyrin (III), stir for 5 minutes, and form Water-in-oil microcapsules, and then ethyl orthosilicate is added to the microcapsule system, after stirring evenly, an appropriate amount of lye is added for hydrolysis, and the entire reaction time is 16 hours. In the reaction system, the ratio of the amount of n-heptanol, n-heptane, surfactant triton X-100, water, temperature-resistant porphyrin, tetraethyl orthosilicate, and lye is 1:1:1:3.5: 0.2:3:5. After the reaction is completed, centrifuge and dry to obtain heat-resistant porphyrin-silicon dioxide toner with a yield of 89%.

[0038] The temperature-resistant porphyrin-silica toner obtained in Example 2 is the holo...

Embodiment 3

[0040] The synthesis of the heat-resistant porphyrin grafted silica toner of formula (IV) structure:

[0041]

[0042] Mix n-heptane, n-heptanol and surfactant Triton X-100 uniformly in a certain proportion, add an appropriate amount of water as a dispersed phase, then add a certain amount of heat-resistant porphyrin (IV), stir for 5 minutes, and form For water-in-oil microcapsules, add tetraethyl orthosilicate into the microcapsule system, stir evenly, add an appropriate amount of lye for hydrolysis, and the entire reaction time is 20 hours. In the reaction system, the ratio of the amount of n-heptanol, n-heptane, surfactant triton X-100, water, temperature-resistant porphyrin, tetraethyl orthosilicate, and lye is 1:10:4:10: 0.5:10:11. After the reaction is completed, centrifuge and dry to obtain heat-resistant porphyrin-silicon dioxide toner with a yield of 95%.

[0043] The temperature-resistant porphyrin-silica toner obtained in Example 3 is a holographic water transf...

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Abstract

The invention discloses a temperature-resistant porphyrin-grafted silica toner and its preparation method and application. The toner is firstly modified with carboxyl and (3-aminopropyl) triethoxysilane groups on porphyrin dyes To obtain heat-resistant porphyrin; mix n-heptane, n-heptanol and surfactant evenly, add water as a dispersed phase, then add heat-resistant porphyrin, stir to form water-in-oil microcapsules, and then add ethyl orthosilicate The ester is added into the microcapsule system, stirred evenly, and finally lye is added for hydrolysis, and after the reaction is completed, it is centrifuged and dried to obtain a temperature-resistant porphyrin-grafted silica toner. The toner can be used for holographic water transfer printing, has excellent temperature resistance, and can withstand long-term baking without deterioration.

Description

technical field [0001] The invention belongs to the field of anti-counterfeiting technology, and specifically relates to a temperature-resistant porphyrin grafted silica toner, a preparation method thereof and an application thereof in holographic water transfer printing. Background technique [0002] Holographic water transfer printing is a new technology that combines water transfer printing technology and laser holographic embossing technology. In specific use, it needs to be processed by holographic molding process and high-temperature baking process, so that the interference fringes of the hologram are embossed on the holographic recording material, and then transferred to the surface of plastic, metal, glass, ceramics, etc. on flat objects. In recent years, holographic water transfer printing technology has developed rapidly with the market demand, and the market potential is huge. [0003] In the high-temperature baking process, it needs to be baked at 200°C for 30 ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B42D25/36
CPCB42D25/36
Inventor 李春阳张诺诺李华容张雄陈茜唐红文李德江郑开波
Owner 湖北宜美特全息科技有限公司
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